Composite backing material adapted for InN-GaN epitaxial growth and method for making same
A technology of epitaxial growth and composite substrate, which is applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve the problems of less usage, increased device volume, waste of raw materials, etc., and achieves the effect of easy operation and simple preparation process
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[0024] Vapor transport equilibrium (VTE) technology used in the present invention prepares composite substrate material MgIn 2 o 4 / MgO experimental setup schematic diagram see figure 1 , in the platinum crucible 1, a certain ratio of MgIn with pores 2 is placed 2 o 4 and In 2 o 3 Mixed material block 3, the upper part of the material block 3 is platinum wire 4, the double-sided polished or single-sided polished MgO wafer 5 is placed on the platinum wire 4, and the upper part of the material block 3 has platinum sheet 6 and MgIn 2 o 4 and In 2 o 3 The mixed powder 7 is covered, the thermocouple 8 is inserted into the powder 7, and the top of the crucible 1 is sealed with a platinum cover 9.
[0025] Vapor transport equilibrium (VTE) technology is a mass transport process, so there should be enough In in the crucible 2 o 3 supply, and secondly, the equilibrium of the gas phase is dependent on In 2 o 3 A steady stream from MgIn 2 o 4 and In 2 o 3 It is maintained...
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