Silicon microchannel production method

Abstract

The invention relates to a method for preparation of a micro channel in the process of preparing Micro Electro-Me-chanical Systems elements, belonging to the technical field of Micro Electro-Me-chanical Systems. The resistance silicon from n (100) can form a hole of about 1 micrometer in special condition in solution of a concentration of 40% of HF: C2H5OH=1: 1, with this layer as template to be corroded out a reverse pyramid depression by KOH or tetramethyl ammonium hydroxide or the similar solution, and with the cellular silicon corrosion technique, the micro channel is corroded. The micro channel sheet for night-vision device can be prepared by oxygenizing the micro channel structure. With the method, the minimum micro-channel diameter and the center distance of channel have a great improvement, the electron multiplication effect also is perfect, the treatment temperature of the micro channel plate can achieve to 1200Deg. C, and the secondary electron emission efficiency is highly improved.

Description

[0001] The invention relates to a manufacturing method of micro-electro-mechanical system devices, in particular to a micro-channel manufacturing method in the manufacturing of micro-electro-mechanical system devices, and belongs to the technical field of microelectronics and micro-electro-mechanical systems. technical background

[0002] The micro-nano channel of silicon refers to the fabrication of micro-nano hole arrays on the silicon substrate by etching. Due to the large increase in the specific surface area of ​​silicon, it will play a very critical role in the manufacture of some devices related to the specific surface area of ​​silicon. . Typical of these applications are DNA hybrid sensors.

[0003] In addition, in modern night vision equipment, the micro-channel plate low-light night vision device is the main equipment in the field of night vision equipment at present. It mainly uses the electrons moving in the channel to collide with the tube w...