Photosensitive resin composition, protective film and separator of LCD panel, forming method thereof and lcd panel

A technology of liquid crystal display panel and resin composition, which is applied in the direction of liquid crystal materials, chemical instruments and methods, and photoplate making process of patterned surface, etc., which can solve the problems of insufficient transparency and achieve the effect of suppressing pollution

Active Publication Date: 2007-04-04
JSR CORPORATIOON
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0011] However, in this case, the use of the protective film for the photosensitive polymerization initiator component of the photosensitive r

Method used

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  • Photosensitive resin composition, protective film and separator of LCD panel, forming method thereof and lcd panel
  • Photosensitive resin composition, protective film and separator of LCD panel, forming method thereof and lcd panel
  • Photosensitive resin composition, protective film and separator of LCD panel, forming method thereof and lcd panel

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0234] Example

[0235] Hereinafter, examples and comparative examples are given to explain the present invention more specifically, but the present invention is not limited to these examples.

Example Embodiment

[0236] Synthesis example 1

[0237] Into a flask equipped with a cooling tube and a stirrer, 7 parts by weight of 2,2'-azobis(2,4-dimethylvaleronitrile) and 200 parts by weight of propylene glycol monomethyl ether acetate were charged. Then put 5 parts by weight of styrene, 20 parts by weight of methacrylic acid, and 25 parts by weight of methacrylic acid tricyclic [5.2.1.0 2，6 ] Decane-8-yl ester, 25 parts by weight of 3-(methacryloxymethyl)-3-ethyloxetane, 20 parts by weight of tetrahydrofurfuryl methacrylate, 5 parts by weight After replacing 1,3-butadiene with nitrogen, start to stir slowly. The temperature of the solution was raised to 70°C, and the temperature was maintained for 5 hours to obtain a polymer solution containing copolymer [A-1]. The solid content concentration of the obtained polymer solution was 30.0% by weight, and the weight average molecular weight of the polymer was 18,000 (the weight average molecular weight is polystyrene measured by GPC (gel permeation ...

Example Embodiment

[0238] Synthesis Example 2

[0239] Into a flask equipped with a cooling tube and a stirrer, 7 parts by weight of 2,2'-azobis(2,4-dimethylvaleronitrile) and 200 parts by weight of diethylene glycol ethyl methyl ether were introduced. Then put 5 parts by weight of styrene, 20 parts by weight of methacrylic acid, and 25 parts by weight of methacrylic acid tricyclic [5.2.1.0 2，6 ] Decane-8-yl ester, 25 parts by weight of glycidyl methacrylate, 20 parts by weight of tetrahydrofurfuryl methacrylate, 5 parts by weight of 1,3-butadiene, after replacing with nitrogen, it starts to slow To stir. The temperature of the solution was raised to 70°C, and the temperature was maintained for 5 hours to obtain a polymer solution containing copolymer [A-2]. The solid content concentration of the obtained polymer solution was 31.0% by weight, and the weight average molecular weight of the polymer was 20,000 (the weight average molecular weight is polystyrene measured by GPC (gel permeation chromatog...

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Abstract

A photosensitive resin composition with enough process range to prevent the contamination of the baking oven and photo cover film from sublimation of the photo polymeric initiator, and having the nature of tight annealing, transparency and thermal resisting of which the protection film and the compression of which spacer material. The photo polymeric initiator composed of: [A](a1) ethylene unsaturated carboxylic acid and/or ethylene unsaturated carboxylic acid anhydride, and another polymer of ethylene unsaturated compound; [B]polymeric compound with ethylene unsaturated bond; and [C] a photo polymeric initiator consisting of the compound presented as following formula(1): wherein, n is integer of 2~12, R1 represent H, hydroxyl group or any one group with structure represented (I), (II) and (III); R2 of (III) is C1~C12 alkyl, C3~C8 cycloalkyl or phenyl group (wherein which could be substituted by any one of at least one or more C1~C6 alkyl, C1~C6 alkyloxy),

Description

technical field [0001] The present invention relates to a photosensitive resin composition, a protective film for a liquid crystal display panel, a separator, and a liquid crystal display panel having them. A photosensitive resin composition as a material for a protective film and a separator, a protective film for a liquid crystal display panel formed from the composition, a separator, and a liquid crystal display panel having the protective film and the separator. Background technique [0002] Radiation devices such as LCDs and CCDs dip display elements with solvents, acids, or alkali solutions during their manufacturing process, and when wiring electrode layers are formed by sputtering, the element surfaces are locally exposed to high temperatures. Then, in order to prevent deterioration or damage of elements due to such treatments, a protective film formed of a thin film resistant to these treatments is provided on the surface of the elements. [0003] Such a protective...

Claims

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Application Information

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IPC IPC(8): G03F7/027G03F7/20G03F7/26G02F1/1333
CPCC09K19/52G03F7/027G03F7/028G03F7/032
Inventor 一户大吾梶田彻
Owner JSR CORPORATIOON
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