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Photosensitive resin composition, protective film and separator of LCD panel, forming method thereof and lcd panel

A technology of liquid crystal display panel and resin composition, which is applied in the direction of liquid crystal materials, chemical instruments and methods, and photoplate making process of patterned surface, etc., which can solve the problems of insufficient transparency and achieve the effect of suppressing pollution

Active Publication Date: 2011-11-23
JSR CORPORATIOON
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0011] However, in this case, the use of the protective film for the photosensitive polymerization initiator component of the photosensitive resin composition used in the formation of the separator listed in this patent document 2 is not good enough from the viewpoint of transparency.

Method used

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  • Photosensitive resin composition, protective film and separator of LCD panel, forming method thereof and lcd panel
  • Photosensitive resin composition, protective film and separator of LCD panel, forming method thereof and lcd panel
  • Photosensitive resin composition, protective film and separator of LCD panel, forming method thereof and lcd panel

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Embodiment

[0235] Hereinafter, although an Example and a comparative example are illustrated and this invention is demonstrated more concretely, this invention is not limited to these Examples.

Synthetic example 1

[0237] In the flask equipped with cooling tube and stirrer, drop 7 parts by weight of 2,2'-azobis(2,4-dimethylvaleronitrile), 200 parts by weight of propylene glycol monomethyl ether acetate. Then drop into 5 parts by weight styrene, 20 parts by weight methacrylic acid, 25 parts by weight methacrylic acid tricyclic [5.2.1.0 2，6 ]decane-8-yl ester, 25 parts by weight of 3-(methacryloyloxymethyl)-3-ethyl oxetane, 20 parts by weight of tetrahydrofurfuryl methacrylate, 5 parts by weight After replacing 1,3-butadiene with nitrogen, start stirring slowly. The temperature of the solution was raised to 70°C, and the temperature was maintained for 5 hours to obtain a polymer solution containing the copolymer [A-1]. The solid content concentration of the obtained polymer solution was 30.0% by weight, and the weight-average molecular weight of the polymer was 18,000 (the weight-average molecular weight was polyphenylene as measured by GPC (Gel Permeation Chromatography) HLC-8020 (manufa...

Synthetic example 2

[0239] In a flask equipped with a cooling tube and a stirrer, 7 parts by weight of 2,2'-azobis(2,4-dimethylvaleronitrile) and 200 parts by weight of diethylene glycol ethyl methyl ether were added. Then drop into 5 parts by weight styrene, 20 parts by weight methacrylic acid, 25 parts by weight methacrylic acid tricyclic [5.2.1.0 2，6 ] Decane-8-yl ester, 25 parts by weight of glycidyl methacrylate, 20 parts by weight of tetrahydrofurfuryl methacrylate, 5 parts by weight of 1,3-butadiene, after replacing with nitrogen, start to slowly Stir. The temperature of the solution was raised to 70°C, and the temperature was maintained for 5 hours to obtain a polymer solution containing the copolymer [A-2]. The solid content concentration of the obtained polymer solution was 31.0% by weight, and the weight-average molecular weight of the polymer was 20,000 (the weight-average molecular weight was polyphenylene as measured by GPC (Gel Permeation Chromatography) HLC-8020 (manufactured by ...

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Abstract

Provided is a photosensitive resin composition having a sufficient process margin, capable of suppressing contamination of a kiln, a photo-mask, etc., due to sublimation of a photoinitiator component, and having adhesion, transparency and heat resistance required for a protective film material, and resolution and compression property required for a spacer material. The photosensitive resin composition contains [A] a copolymer of (a1) an ethylenically unsaturated carboxylic acid and / or an ethylenically unsaturated carboxylic acid anhydride and (a2) a copolymers of another ethylenically unsaturated compound, [B] a polymerizable compound having an ethylenically unsaturated bond, and [C] a photopolymerization initiator comprising a compound represented by formula (1).

Description

technical field [0001] The present invention relates to a photosensitive resin composition, a protective film for a liquid crystal display panel, a separator, and a liquid crystal display panel having them. A photosensitive resin composition as a material for a protective film and a separator, a protective film for a liquid crystal display panel formed from the composition, a separator, and a liquid crystal display panel having the protective film and the separator. Background technique [0002] Radiation devices such as LCDs and CCDs dip display elements with solvents, acids, or alkali solutions during their manufacturing process, and when wiring electrode layers are formed by sputtering, the element surfaces are locally exposed to high temperatures. Then, in order to prevent deterioration or damage of elements due to such treatments, a protective film formed of a thin film resistant to these treatments is provided on the surface of the elements. [0003] Such a protective...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/027G03F7/20G03F7/26G02F1/1333
CPCC09K19/52G03F7/027G03F7/028G03F7/032
Inventor 一户大吾梶田彻
Owner JSR CORPORATIOON
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