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Nano monocrystalline diamond and method for making same

A single crystal diamond and nano-single crystal technology, applied in the direction of single crystal growth, single crystal growth, manufacturing tools, etc., can solve the problems of high cost, impossibility of application, easy aggregation of nanoparticles, etc., and achieve low production cost and reliable technical support Effect

Inactive Publication Date: 2007-05-16
北京国瑞升精机科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although nanodiamonds have many potential uses, due to the influence of various groups and high surface energy on the surface, nanoparticles are easy to agglomerate, difficult to disperse, and lose many properties that should be used as nanoparticles. , the cost is quite high and cannot be widely used

Method used

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  • Nano monocrystalline diamond and method for making same
  • Nano monocrystalline diamond and method for making same
  • Nano monocrystalline diamond and method for making same

Examples

Experimental program
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Effect test

Embodiment 1

[0060] Micro-grinding and centrifugal classification are performed on single crystal diamond particles with a nominal particle size of 4--8um. For the pulverization step, a steel ball mill jar with a diameter and length of 150 mm was used. 100 grams of the above-mentioned original diamond powder are loaded, and 6 kg of steel balls with a diameter of 12 mm, 8 mm and 6 mm are respectively loaded in a ratio of 1: 2: 4, and the ball mill jar is operated at 90 n / min for 120 hours. The pulverized powder is taken out from the tank, put into 1000ml of 10% dilute hydrochloric acid solution, heated and reacted for 1 hour, the components of metal impurities are removed by dissolving, and then fully washed with water until the pH value is about 6.5. Dehydration and drying, and then put the powder in 1000ml of mixed acid solution of perchloric acid and sulfuric acid (perchloric acid: sulfuric acid = 1: 2) and heat treatment for 1.5 hours. When the color does not change, stop heating, centr...

Embodiment 2

[0062] Crush and centrifugally classify single crystal diamond particles with a nominal particle size of 2-4um. Load 100 grams of the above-mentioned raw diamond powder. Load 5kg of steel balls with diameters of 10mm, 6mm and 4mm in a ratio of 1:4:6 , the ball mill tank was operated at 80n / min (rpm) for 72 hours, the pulverized powder was taken out from the tank, put into 1000ml of 20% dilute hydrochloric acid solution, and heated for 0.5 hours to remove metal impurities by dissolution, and then fully rinsed with water To a pH value of about 6.5. Dehydration and drying, then place the powder in 1000ml of mixed acid solution of perchloric acid and sulfuric acid (perchloric acid: sulfuric acid = 1:1) and heat treatment for 1.5 hours. When the color does not change, stop heating, centrifugal washing, pH = 4, dehydrated and dried. Then, according to the ratio of material: alkali = 1: 3, put it in a nickel tongs pot. Keep it warm at 400 degrees for 2 hours. After it cools down, po...

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Abstract

The invention discloses a manufacturing method of nanometer single-crystal diamond, which comprise the following steps: 1. grinding the single-crystal diamond particle with grain size more than nanometer grade; obtaining the micropowder of nanometer single-crystal diamond; 2. proceeding acid and alkaline disposal for micropowder; removing metal, graphite and silicon separately; 3. utilizing multi-pipe high-speed centrifuger to grade the micropowder into different grain sizes; obtaining the even grain size at 100nm or less.

Description

technical field [0001] The invention relates to superhard material nano powder technology, in particular to a nano single crystal diamond and a manufacturing method thereof. Background technique [0002] With the development of science and technology, the surface finish of many precision devices is very high, such as computer disks, magnetic heads, optical communication devices, optical crystals, semiconductor substrates and other devices, all require precise polishing. The accuracy and performance of the design will not be guaranteed if there are bumps, scratches or foreign objects attached to the range. Therefore, the final surface polishing is an important process that affects the performance of precision devices. [0003] Looking at the polishing materials used in various polishing processes, they can be divided into two types in terms of morphology, namely polishing liquid and polishing film. There are many types in terms of materials, such as diamond, silicon carbide,...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B29/04B02C17/14B28D5/00C09K3/14
Inventor 祝世连葛丙恒
Owner 北京国瑞升精机科技有限公司
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