Mgf2 optical thin film containing amorphous silicon oxide binder, optical device having same, and method for producing such mgf2 optical thin film

A technology of optical film and manufacturing method, applied in the field of optical systems, capable of solving problems such as insufficient performance of anti-reflection film

Active Publication Date: 2007-06-27
NIKON CORP
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0018] However, the above can only be established under the premise of sacrificing the degree of freedom in optical design. When faced with the above-mentioned high-performance requirements or the use of new components such as CCD, it can be seen that the performance of the anti-reflection coating until now is not enough.

Method used

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  • Mgf2 optical thin film containing amorphous silicon oxide binder, optical device having same, and method for producing such mgf2 optical thin film
  • Mgf2 optical thin film containing amorphous silicon oxide binder, optical device having same, and method for producing such mgf2 optical thin film
  • Mgf2 optical thin film containing amorphous silicon oxide binder, optical device having same, and method for producing such mgf2 optical thin film

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Experimental program
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Effect test

Embodiment 1-5

[0192] Take MgF 2 The concentration is 1%, and the hydrofluoric acid / magnesium acetate ratio is 1.95. Mix hydrofluoric acid methanol solution with magnesium acetate methanol solution to prepare MgF 2 Sol solution. Next, the sol solution was subjected to high-temperature and high-pressure treatment at 140° C. for 24 hours. Treated MgF 2 MgF in sol solution 2 The microparticles have an average particle diameter of 20 nm as measured by electron microscope observation. After concentrating the sol solution with a rotary evaporator, it was diluted with 1-propanol to replace 6-7% of the methanol solvent. MgF 2 MgF in sol solution 2 The concentration is 2.5%, and the porous MgF is formed by spin-coating at 2000rpm on a quartz glass substrate with a thickness of 3mm. 2 membrane.

[0193] The substrate was dried at 70° C. for 1 hour, and then returned to room temperature. As the binder solution, the stock solution of Seminstein G-200B, or its dilution with 2-butanol to 1.5 time...

Embodiment 6-8

[0197] Except for MgF 2 The concentration is 1%, the hydrofluoric acid / magnesium acetate ratio is 1.98, 1.99 and 2.0, the hydrofluoric acid methanol solution is mixed into the magnesium acetate methanol solution to prepare MgF 2 Except sol solution, all the other are identical with embodiment 1-5, utilize secondary coating method to form MgF 2 -SiO 2 membrane. Table 1 shows the measurement results of the properties of the obtained film.

Embodiment 1

[0200] The MgF that embodiment 1 and 7 obtain 2 -SiO 2 The scanning electron micrographs of the cross-sections of the membranes are shown in Fig. 3 and Fig. 4, respectively. As for the film of Example 1 shown in FIG. 3 , since the edge of the cross section of the film is clear, it can be seen that the film is relatively dense. As shown in FIG. 4 , in the membrane of Example 7, the edge of the membrane cross section was uneven (porous) and unclear.

[0201] MgF is visible on the membrane surface of both 2 Concavities and convexities caused by particles, in MgF 2 SiO is not formed on the film 2 membrane. irradiated to the MgF 2 -SiO 2 The light of the film has a minimum wavelength of 190nm, and the MgF placed on the film surface (outermost) 2 There is no SiO of 5% or more of the wavelength (that is, more than 9.5nm) on the surface of the microparticles. 2 . MgF on the membrane surface 2 SiO on the surface of microparticles 2 For specific thickness, the average thickn...

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Abstract

An MgF 2 optical thin film 100 is formed on an optical surface of a base material 10. The MgF 2 optical thin film 100 includes MgF 2 particles 12 and an amorphous silicon oxide-based binder 13 which exists on the surfaces of the MgF 2 particles and between the MgF 2 particles. Owing to this amorphous silicon oxide-based binder 13, the optical thin film 100 can have high mechanical strength and high adhesion to the base material 10, while having excellent environment resistance and a lower refractive index.

Description

technical field [0001] The invention provides a method using MgF 2 Formed single-layer or multi-layer optical thin film and its manufacturing method, and MgF 2 Optical components of optical films and optical systems used in optical devices such as cameras, microscopes, binoculars, exposure devices, etc. that incorporate the optical components. Background technique [0002] Anti-reflection coatings are applied to the surface of each lens constituting an optical system such as a camera lens or a microscope objective lens to reduce reflection. In general, optical thin films such as anti-reflection films are produced by a dry process (dry process), and methods such as vacuum evaporation, sputtering, and CVD (Chemical Vapor Deposition) can be used. [0003] In order to obtain a high-performance optical film with low reflectance in a wide wavelength range or a wide angle range, it is known that only a plurality of coating materials having different refractive indices are combine...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B1/11C03C17/22C03C17/25C01F5/28G02B1/113
Inventor 石泽均新坂俊辅村田刚
Owner NIKON CORP
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