Scribing sapphire substrates with a solid state UV laser
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[0030] A detailed description of embodiments of the present invention is provided with reference to FIGS. 1 through 8A-8C, and experimental results are shown in FIGS. 9-16.
[0031]FIG. 1 is a simplified block diagram of a sapphire scribing system according to the present invention. In the embodiment shown, a diode pumped, solid-state laser 10 generates high-density UV and close-to-UV pulses at a repetition rate in the kHz range. In preferred systems, the laser comprises a Q-switched Nd:YVO4 medium delivering third harmonic output as the stream of laser pulses at a repetition rate greater than 10 kHz, with a pulse duration of about 40 nanoseconds. The pulses are provided using an optical delivery system 11 and turning mirror 12 to an ultraviolet objective lens 13, which focuses the pulses on a sapphire substrate 14. The substrate 14 is supported on a vacuum chuck and X / Y stage 15. Preferably, the wafer is supported face down on an adhesive wafer tape. A gas debris removing system 16 c...
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