Photovoltaic apparatus and mass-producing apparatus for mass-producing spherical semiconductor particles
a photovoltaic apparatus and semiconductor technology, applied in the direction of pv power plants, sustainable manufacturing/processing, final product manufacturing, etc., can solve the problems of high cost expenditure of related art photovoltaic apparatus, waste of time, and complex step for manufacturing semiconductor wafers, so as to reduce the recombination rate of the surface layer, high reliability, and high efficiency of photovoltaic apparatus
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example 1
[0212] A silicon material of about 1.5 ml was put in a carbon crucible that has an outer diameter 20 mm, an external length 40 mm, and a capacity represented by an inner diameter 10 mm and a length 35 mm and that is accommodated in a ceramic air-tight and heat-insulative container having, at one end, a nozzle of 1 mm in internal diameter and 5 mm in length. Immediately before particle formation, high-frequency induction power of 4.6 kW was applied for about 20 minutes to stabilize particle forming conditions such as temperature. Particle formation was started with application of a nitrogen gas pressure of about 300 Pa, and silicon spheres having an average diameter of about 1 mm were produced. To decrease the degree of reaction between silicon and carbon as well as the degree of carbon burning due to presence of oxygen, a nitrogen gas pressure of about 100 Pa was maintained in a system in which the flow rate is made zero at the start of application of the high-frequency induction po...
example 2
[0213] A silicon material of about 1.5 ml was put in a carbon crucible that has an outer diameter 20 mm, an external length 40 mm, and a capacity represented by an inner diameter 10 mm and a length 30 mm and that is accommodated in a ceramic air-tight and heat-insulative container having, at one end, a nozzle of 1 mm in internal diameter and 10 mm in length. Immediately before particle formation, high-frequency induction power of 4.6 kW was applied for about 15 minutes to stabilize particle forming conditions such as temperature. Particle formation was started with application of a nitrogen gas pressure of about 500 Pa, and silicon spheres having an average diameter of about 1 mm were produced. To decrease the degree of reaction between silicon and carbon as well as the degree of carbon burning due to presence of oxygen, a nitrogen gas pressure of about 100 Pa was maintained in a system in which the flow rate is made zero at the start of application of the high-frequency induction p...
example 3
[0214] A silicon material of about 1.2 ml was put in a carbon crucible that has an outer diameter 20 mm, an external length 40 mm, and a capacity represented by an inner diameter 10 mm and a length 25 mm and that is accommodated in a ceramic air-tight and heat-insulative container having, at one end, a nozzle of 1 mm in internal diameter and 10 mm in length. Immediately before particle formation, high-frequency induction power of 3.6 kW was applied for about 20 minutes to stabilize particle forming conditions such as temperature. Particle formation was started with application of a nitrogen gas pressure of about 300 Pa, and silicon spheres having an average diameter of about 1 mm were produced. To decrease the degree of reaction between silicon and carbon as well as the degree of carbon burning due to presence of oxygen, a nitrogen gas pressure of about 100 Pa was maintained in a system in which the flow rate is made zero at the start of application of the high-frequency induction p...
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