This invention provides a post-makeup, post-makeup removal, and post-
sun exposure repair composition containing
purslane extract and its application, belonging to the field of cosmetic technology. The composition of this invention comprises the following components in parts by weight: 1.0–10.0 parts
purslane extract, 1.0–8.0 parts fermented
mung bean sprout extract, 0.1–3.0 parts immortelle extract, and 0.1–3.0 parts
ectoine. This invention uses
purslane extract as a soothing and repairing base; fermented
mung bean sprout extract to improve
oxidative stress after makeup, makeup removal, and
sun exposure; immortelle extract to improve redness,
burning sensation, and discomfort after
irritation; and
ectoine to enhance the
skin's
stress resistance and tolerance. These four components synergistically form a complex care
system of "soothing redness—
antioxidant stabilization—
plant repair—anti-stress tolerance," which can effectively improve problems such as redness after makeup, tightness after makeup removal,
burning sensation, stinging,
dryness, and unstable
skin barrier after
sun exposure. The composition of this invention is mild and can be prepared into various dosage forms such as essence water, wet compress water, spray, gel
mask, gel, sheet
mask, cream
mask, serum,
lotion, etc., which are suitable for industrial production and daily
skin care use.