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Method for preparing nano micron pore array template of two-dimensional regular polymer

A nano-micron and hole array technology is applied in the field of preparation of two-dimensional regular polymer nano-micron hole array templates, which can solve the problems of difficulty in synthesizing latex particles, small selection of synthesis monomers, and complicated processes, and achieves wide application value. , Easy to operate, simple effect of hole making process

Inactive Publication Date: 2007-09-05
TSINGHUA UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] However, both of the above methods have certain limitations
The process of method 1 is complicated, and multi-step processing is required when inverting the latex particle array into a hole array, and the compatibility between the filler material and latex particles needs to be considered when selecting the filling material; the synthesis of latex particles in method 2 is difficult, The choice of synthetic monomers is small, so there are many limitations in the application of the above methods

Method used

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  • Method for preparing nano micron pore array template of two-dimensional regular polymer
  • Method for preparing nano micron pore array template of two-dimensional regular polymer

Examples

Experimental program
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Effect test

Embodiment 1

[0033] (1) Synthetic latex particles:

[0034] Take 10g of a mixture of styrene and methacrylic acid, the mass ratio of the two is: styrene:methacrylic acid=1:0.08, add 100ml of water to the above mixture, and adjust the pH value to 9 with alkali;

[0035] Stir and heat to 60°C, add 0.08g of ammonium persulfate as an initiator, continue to heat up to 80°C and react for 12 hours to obtain an emulsion;

[0036] (2) Preparation of two-dimensional regular latex particle array template: Dilute the synthesized emulsion 200 times with water, immerse the silicon chip with a clean surface in the emulsion vertically, pull the immersed surface out of the emulsion at a speed of 1 μm / min, and dry it Obtain a two-dimensional regular latex particle array;

[0037] (3) Preparation of two-dimensional structured polymer nano-micro hole array template:

[0038] At a temperature of 0° C., the above-mentioned latex particle array was placed in a vapor environment of chloroform solvent, treated f...

Embodiment 2

[0040] Take 10g of a mixture of styrene and methacrylic acid, the mass ratio of the two is: styrene:methacrylic acid=1:0.3, add 100ml of water to the above mixture, and adjust the pH value to 6 with alkali;

[0041] Stir and heat to 60°C, add 0.16 g of initiator potassium persulfate, continue to heat up to 80°C and react for 12 hours to obtain an emulsion;

[0042] (2) Preparation of two-dimensional regular latex particle array template: dialyze the synthesized emulsion with methanol to a concentration of 0.01g / ml, drop it on the surface of the rotating silicon wafer, and the rotation speed and time are 300rpm (10s) plus 2000rpm (2min ), the latex particle array is obtained after drying.

[0043] (3) Preparation of two-dimensional structured polymer nano-micro hole array template:

[0044] At a temperature of 20° C., the above-mentioned latex particle array was placed in a vapor environment of dichloromethane solvent, treated for 30 minutes, taken out and dried to obtain a po...

Embodiment 3

[0046] Take 10g of a mixture of styrene and methacrylic acid, the mass ratio of the two is: styrene:methacrylic acid=1:0.8, add 100ml of water to the above mixture, and adjust the pH value to 1 with alkali;

[0047]Stir and heat to 60°C, add 0.3 g of ammonium persulfate as an initiator, continue to heat up to 80°C and react for 12 hours to obtain an emulsion;

[0048] (2) Preparation of two-dimensional regular latex particle array template: Dilute the synthesized emulsion 300 times with water, vertically immerse the silicon chip with a clean surface in the diluted emulsion, and evaporate at 40°C for 48 hours to obtain the latex particle array .

[0049] (3) Preparation of two-dimensional structured polymer nano-micro hole array template:

[0050] At a temperature of 30° C., the above-mentioned latex particle array was placed in a vapor environment of tetrahydrofuran solvent, treated for 10 minutes, taken out and dried to obtain a polymer nano-micro hole array template.

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Abstract

The related preparation method for two-dimensional regular polymer nano porous array template comprises: adding emulsifier and water into the mixture with nucleating monomer and forming-shell monomer, using acid or base to adjust pH value; heating and stirring, adding initiator to obtain emulsion by polymerization reaction; using vertical pulling method, rotation coating or solvent evaporation method to prepare the two-dimensional regular emulsion particle array template; treating the former template in solvent vapor; finally, taking out and drying. This invention makes use of self-assemblage property and different solubility of emulsion particles, simplifies process, and has wide material source.

Description

technical field [0001] The invention relates to a preparation method of a two-dimensional regular polymer nano-micro hole array template, which belongs to the technical field of polymer materials. Background technique [0002] Due to its unique structure and performance, the two-dimensional structured nano-micro hole array template has high application value, and has been widely used in many fields such as catalysis, photonic crystals, optoelectronic devices, and cell culture. So far, many methods have been used to prepare regular hole array templates, such as electron exposure etching, electrochemical etching, microcontact printing and other techniques. However, the above methods have certain limitations, such as low efficiency and high cost of electronic exposure etching technology; electrochemical etching is difficult to prepare templates with line widths below 100nm; templates prepared by microcontact printing have low resolution and are difficult to operate. Difficulty...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08J5/02C08J9/26
Inventor 庹新林钱骏袁俊王晓工
Owner TSINGHUA UNIV
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