Microwave adjustable dielectric barium strontium titanate/bismuth zinc niobate composite film and its preparation method
A technology of barium strontium titanate film and barium strontium titanate, which is applied in ceramics, inorganic insulators, etc., can solve the problems of high coercive field strength, low electrical quality factor, unfavorable device application, etc., and achieves good temperature stability. Effect
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[0019] The preparation process of barium strontium titanate and bismuth-zinc-niobium precursor solutions are the same
[0020] 1. Preparation of barium strontium titanate precursor solution: using analytically pure strontium acetate, barium acetate, and tetrabutyl titanate as raw materials, glacial acetic acid as solvent, and acetylacetone as chelating stabilizer to synthesize barium strontium titanate precursor solution , First according to the chemical composition as Ba 0.5 Sr 0.5 TiO 3 Dissolve barium acetate and strontium acetate that meet the stoichiometric ratio in glacial acetic acid, stir well at 80°C for 30 minutes, mix tetrabutyl titanate and acetylacetone at a molar ratio of 2:1, and then add the mixed solution of barium acetate And stir at room temperature for 30 minutes to finally obtain a clear barium strontium titanate precursor solution with a concentration of 0.4 mol / L;
[0021] 2. Preparation of bismuth-zinc-niobium precursor solution: using analytically pure nio...
Embodiment 1
[0025] On the Pt-plated silicon wafer, a layer of barium strontium titanate film is first deposited by a spin coating process, and fast heat-treated at 650° C. for 3 minutes to obtain a barium strontium titanate film with a cubic perovskite structure. Then, a layer of bismuth-zinc-niobium film is deposited on the barium strontium titanate film, and the bismuth-zinc-niobium film with cubic pyrochlore structure is obtained by rapid heat treatment at 700°C for 3 minutes. Repeat the above process to finally obtain a six-layer composite film with three layers of barium strontium titanate and three layers of bismuth zinc niobium. The thickness is 0.5μm, and the surface is smooth without cracks. The crystalline phase structure also contains cubic pyrochlore phase bismuth zinc niobium and cubic perovskite phase strontium barium titanate. The dielectric constant is 150, the dielectric loss is 1.5%, and the coercive field strength is 200KV / cm.
Embodiment 2
[0027] On the Pt-plated silicon wafer, a layer of bismuth-zinc-niobium film is deposited by a spin-coating process, and then quickly heat-treated at 700°C for 3 minutes to obtain a bismuth-zinc-niobium film with a cubic pyrochlore structure. Then, a layer of barium strontium titanate film is deposited on the bismuth-zinc-niobium thin film, and rapid heat treatment is performed at 550° C. for 3 minutes to obtain a barium strontium titanate film with cubic perovskite structure. By repeating the above process, an eight-layer composite film with 4 layers of barium strontium titanate and 4 layers of bismuth zinc niobium is finally obtained. The thickness is 0.7μm, and the surface is smooth without cracks. The crystalline phase structure also contains cubic pyrochlore phase bismuth zinc niobium and cubic perovskite phase strontium barium titanate. The dielectric constant is 180, the dielectric loss is 2%, and the coercive field strength is 150KV / cm.
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