Method for preparing RuO2 coating cathode film material of super capacitor
A technology of supercapacitor and preparation process, applied in the direction of electrolytic inorganic material coating and other directions, can solve the problems of cracking, loose film, poor adhesion, etc., and achieve the effect of simple process and easy operation
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Embodiment approach 1
[0015] ① First, polish the 1.5cm×1.5cm tantalum foil with 600# metallographic sandpaper, degrease with acetone for 5 minutes, then wash the sample with deionized water in turn, soak in lye for 15 minutes (sodium phosphate 40g / L, hydroxide Sodium 5g / L, sodium silicate 20g / L and sodium carbonate 10g / L) degreasing at 80°C for 10 minutes; in order to improve the adhesion between the substrate and the film, electrochemical degreasing was carried out, and then ultrasonic cleaning was carried out, and then mixed acid (20mL of 40% hydrofluoric acid, 10mL of 1.4g / mL nitric acid and 15mL of 1.84g / mL sulfuric acid) for chemical polishing, and finally stored in deionized water for future use.
[0016] ② Weigh RuCl 3 ·3H 2 O and NaNO 3 Configure the solution and let it stand for several hours to make the RuCl 3 The concentration is 5mmol / L, NaNO 3 The concentration is 0.1mol / L. During the electrodeposition process, the temperature of the solution was kept at 50°C, and the current dens...
Embodiment approach 2
[0019] ① First, polish the 1.5cm×1.5cm tantalum foil with 600# metallographic sandpaper, degrease with acetone for 10 minutes, then wash the sample with deionized water in turn, soak in lye for 10 minutes (sodium phosphate 40g / L, hydroxide Sodium 5g / L, sodium silicate 20g / L and sodium carbonate 10g / L) degreasing at 70°C; in order to improve the adhesion between the substrate and the film, electrochemical degreasing was carried out, followed by ultrasonic cleaning, and then mixed acid ( 20mL of 40% hydrofluoric acid, 10mL of 1.4g / mL nitric acid and 15mL of 1.84g / mL sulfuric acid) for chemical polishing, and stored in deionized water for future use.
[0020] ② Weigh RuCl 3 ·3H 2 O and NaNO 3 Configure the solution and let it stand for several hours to make the RuCl 3 The concentration is 2mmol / L, NaNO 3 The concentration is 0.25mol / L. During the electrodeposition process, the temperature of the solution was kept at 25°C, and the current density was 30mA / cm 2 , the electrod...
Embodiment approach 3
[0024] ① First, polish the tantalum foil of 1.5cm×1.5cm with 600# metallographic sandpaper, degrease with acetone for 8 minutes, then wash the sample with deionized water in turn, soak in lye for 12 minutes (sodium phosphate 40g / L, hydroxide Sodium 5g / L, sodium silicate 20g / L and sodium carbonate 10g / L) degreasing at 75°C; in order to improve the adhesion between the substrate and the film, electrochemical degreasing was carried out, and then ultrasonic cleaning was carried out, and then mixed acid ( 20mL of 40% hydrofluoric acid, 10mL of 1.4g / mL nitric acid and 15mL of 1.84g / mL sulfuric acid) for chemical polishing, and finally stored in deionized water for future use.
[0025] ② Weigh RuCl 3 ·3H 2 O and NaNO 3 Configure the solution and let it stand for several hours to make the RuCl 3 The concentration is 5mmol / L, NaNO 3 The concentration is 0.1mol / L. During the electrodeposition process, the temperature of the solution was kept at 50°C, and the current density was 45m...
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