Method for manufacturing low ultraviolet optics attrition aluminum oxide thin film

A technology of alumina and ultraviolet light, which is applied to chemical instruments and methods, cleaning methods using liquids, cleaning methods and utensils, etc., can solve the problems of looseness, oxygen loss structure of aluminum oxide film, and increased absorption loss, etc., and achieves fast , good time stability and environmental stability, the effect of reducing requirements

Inactive Publication Date: 2008-07-16
EAST CHINA UNIV OF SCI & TECH
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Problems solved by technology

The classic electron beam thermal evaporation method is still a relatively good coating technology for aluminum oxide films, but the aluminum oxide films deposited by this method are prone to oxygen loss and loose structure.
In order to obtain a dense and low-loss film layer, people often use reactive evaporation or ion-assisted technology to deposit thin films, but the additional auxiliary gas and ion source will bring new pollution, which will increase the absorption loss, and it will affect the coating machine. Vacuum systems make higher demands
[0004] So far, due to the limitation of deposition process and other factors, there is no good way to completely solve the unfavorable factors affecting the performance of thin film in thin film deposition

Method used

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Examples

Experimental program
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Effect test

Embodiment 1

[0029] In the DMD-450 vacuum physical vapor deposition (PVD-Physical Vapor Deposition) coating system, the aluminum oxide film was deposited by electron beam thermal evaporation. The substrate material used is JGS1 type fused silica, the substrate size is φ30×3mm, and the purity of the alumina material is calibrated to be 99.99%. Before coating, the substrate is placed in a mixed solution of petroleum ether and water for ultrasonic cleaning, and then scrubbed with petroleum ether solution. The working vacuum degree of the coating process is 6.5×10 -3 Above Pa, the baking temperature is 300°C. The thickness of the film is monitored by the light control method, the monitoring wavelength is 620nm, and the optical thickness of the film layer is 6 1 / 4 wavelengths.

[0030] The prepared aluminum oxide film was annealed at an annealing temperature of 400° C. for 1.5 h. During annealing, the temperature was raised and lowered slowly, and the gas in the annealing furnace was air.

...

Embodiment 2

[0033] In the DMD-450 vacuum physical vapor deposition (PVD-Physical Vapor Deposition) coating system, the 193nm reflective film was deposited by electron beam thermal evaporation. Film system selection of high reflection film (HL) 13 H, where H stands for Aluminum oxide film layer of high refractive index material with optical thickness, L stands for Magnesium fluoride film layer of low refractive index material with optical thickness, subscript '13' represents (HL) repetition period number. The substrate material is K9 glass, the substrate size is φ30×3mm, the purity of the alumina material is calibrated to 99.99%, and the purity of the magnesium fluoride material is calibrated to 99.999%. The substrate cleaning adopts the process of ultrasonic treatment in the mixed solution of petroleum ether and water, and then scrubbing with petroleum ether solution. The working vacuum of all films is 6.5×10 -3 Pa, the baking temperature is 300°C, and the thickness of each layer of...

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PUM

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Abstract

The invention relates to a preparing method for alumina films with low ultraviolet optical consumption and mainly comprises the following steps: ultrasonic cleaning is carried out first for substrates in water, then being carefully scrubbed with petroleum ether; the substrates and materials are put on fixtures and into crucibles of a vacuum chamber and plated with the alumina films by adopting an electron beam thermal evaporating method; reaction gases are not pumped in the plating process with air as the residual gas, the working vacuum degree is 3.5 multiplied by 10<- 3>Pa to 7.5 multiplied by 10<- 3>Pa and the deposition temperature is 300 - 350 DEG C; finally the deposited films are post-processed by adopting the treatment technology of filming post annealing and the air in an annealing furnace is air. The invention can reduce the ultraviolet optical consumption of alumina films greatly and is characterized by high efficiency, simple process and lower cost.

Description

Technical field: [0001] The invention relates to an optical thin film, in particular to a method for preparing an aluminum oxide thin film with low ultraviolet optical loss. technical background: [0002] Due to the development of the semiconductor industry and the laser material processing industry, the demand for high-quality high-energy optical components used in the ultraviolet band, especially the extreme ultraviolet-vacuum ultraviolet (DUV-VUV) band, has risen sharply. Most of these components are used after coating, so the optimization and improvement of the performance of ultraviolet band thin film components is facing new challenges. The shorter the wavelength, the fewer coating materials are available, especially high refractive index coating materials. In the DUV band or even in the band below 200nm, alumina material is widely used in multilayer dielectric reflective film as the most commonly used high refractive index material. The optical properties of aluminu...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/08C23C14/26C23C14/02B08B3/12C23C14/54C23C14/58
Inventor 尚淑珍赵祖欣周文煊黄俊
Owner EAST CHINA UNIV OF SCI & TECH
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