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Active energy ray-curable composition

A curable composition and active energy ray technology, which is applied in the field of active energy ray curable compositions, can solve problems such as insufficient sensitivity, inability to obtain resolution, and residual coating film

Active Publication Date: 2010-10-20
TOAGOSEI CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] At this time, there are problems as follows: polyfunctional (meth)acrylate is insoluble in alkali, and film residue occurs in the uncured part of the coating film during development, and sufficient resolution cannot be obtained. Carboxyl group-containing polyfunctional (meth)acrylates obtained by addition of acyl group compounds to dicarboxylic acid anhydrides
However, according to this composition, although the alkali solubility is improved by using a compound having one carboxyl group in one molecule, the sensitivity is not sufficient in addition to being practically insufficient.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

manufacture example 1

[0161] (1) Esterification reaction

[0162] As raw materials, 400 g (1.58 mol) of dipentaerythritol and 821 g (11.4 mol) of acrylic acid were used. As a solvent, 775 g of toluene was used, and the above-mentioned raw materials, 17 g of sulfuric acid as a catalyst, and 2.2 g of hydroquinone monomethyl ether (hereinafter referred to as "MQ") as a polymerization inhibitor were added, and the esterification reaction was carried out at 90°C. 6 hours.

[0163] (2) Neutralization treatment

[0164] After the above reaction, 1690g of toluene was added, the reaction solution was filtered using filter paper, and then washed with 875g of distilled water, 800g of 10% NaOH aqueous solution was added to the washed reaction solution, and the neutralization treatment was carried out at room temperature for 1 hour. .

[0165] (3) Water washing treatment

[0166] After the above neutralization treatment, the organic layer and the water layer were separated, and the water layer was removed. In order to...

manufacture example 2

[0179] (1) Esterification reaction

[0180] The raw material acrylic acid was set to 683 g (9.48 mol), except that the esterification reaction was carried out in accordance with Production Example 1.

[0181] (2) Neutralization treatment

[0182] All were neutralized according to Manufacturing Example 1.

[0183] (3) Water washing treatment

[0184] All were washed with water in accordance with Manufacturing Example 1. Acrylate (hydroxyl value 72 mgKOH / g) was obtained.

[0185] (4) Acid modification

[0186] 250 g of the acrylate obtained in (3) was placed in a glass flask, 32 g of succinic anhydride and 0.13 g of hydroquinone monomethyl ether were added, and the temperature was raised to 85°C. After adding 1.3 g of the catalyst triethylamine, the reaction was carried out for 4 hours. The reaction was carried out in an air / nitrogen mixed atmosphere to obtain a compound having an acid value of 68 mgKOH / g (hereinafter referred to as "ab2"). The obtained compound was analyzed by a high-p...

manufacture example 3

[0187] ○Production example 3 [Production of (f) component]

[0188] In a detachable flask equipped with a stirrer, thermometer, reflux condenser, dropping funnel, and nitrogen introduction tube, 52% of benzyl methacrylate, 23% of acrylic acid, and 2 times the amount of diethylenediene relative to the total amount of monomers are added Dimethyl ether (hereinafter referred to as "DMDG"), 5% of 2,2'-azobis(2-methylbutyronitrile) with respect to the total amount of monomers was uniformly dissolved. Then, the mixture was stirred at 85°C for 2 hours under a nitrogen stream, and further reacted at 100°C for 1 hour. Furthermore, 25% of glycidyl methacrylate, 10% of triethylamine relative to glycidyl methacrylate, 1% of hydroquinone relative to glycidyl methacrylate were added to the obtained solution, and The added monomer and glycidyl methacrylate were added together with 35% DMDG by weight, and stirred at 100°C for 5 hours to obtain a desired copolymer solution (solid content concentr...

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Abstract

Disclosed is an active energy ray-curable composition which exhibits high exposure sensitivity and good developability, thereby enabling to form a precise and accurate pattern when used as an active energy ray-curable pattern-forming composition. This active energy ray-curable composition is excellent in various physical properties such as coating film strength, heat resistance and chemical resistance after it is cured. The active energy ray-curable composition contains, as essential components, a compound (a) wherein an acid anhydride is added to a compound having three or more (meth)acryloyl groups and a hydroxyl group, and a compound (b) wherein a hydroxyl group in a compound having three or more (meth)acryloyl groups and a hydroxyl group is added to at least one (meth)acryloyl group of the component (a) by Michael addition.

Description

Technical field [0001] The present invention relates to an active energy ray-curable composition. The composition of the present invention can be used in various applications of pattern forming compositions such as inks, coatings, and photoresists. In particular, it can be preferably used because of its excellent alkali developability. Used as a composition for pattern formation, it belongs to these technical fields. Background technique [0002] Currently, (meth)acrylates are often used as a pattern forming composition used for forming color photoresists for etching resists, solder resists, and color layers of color filters. In this case, for the purpose of improving the sensitivity of the composition and increasing the hardness of the cured product, a compound having two or more (meth)acryloyl groups (hereinafter referred to as polyfunctional (meth)acrylate) is generally used. [0003] At this time, there is the following problem: the polyfunctional (meth)acrylate is insoluble i...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08F20/20C08F2/46
CPCC08F222/1006C08F2/50C08F2/46C08F20/06C08F20/20
Inventor 长谷川三高小岛慎司
Owner TOAGOSEI CO LTD