Apparatus for implementing non-mask surface plasma interference photolithography by using Lloyd lens

Abstract

The invention relates to a device of realizing the interference photolithography of a maskless surface plasma body through a laue mirror. The device comprises a precision turntable capable of adjusting the incident light angle, a rectangular dove prism capable of coupling and exciting the surface plasma body interference, a compressing device capable of compressing a substrate and the rectangular dove prism, and a support capable of fixing the compressing device. One side face of the rectangular dove prism is fixed on the precision turntable; a P polarized laser beam reaches the inclined plane in a mode of vertical incidence; and the precision turntable is adjusted finely to determine the real resonance angle for exciting the surface plasma body. The substrate coated with photoresist is arranged on the bottom surface of the prism; and the compressing device is adjusted so as to compress the prism and the substrate. A wide beam reaches the prism in a mode of incidence with the real resonance angle; and the surface plasma body interference and the exposure of the photoresist can be realized on the lower surface of a metal membrane; and the substrate after exposure is taken off. The surface plasma body interference photolithography is realized after the postbaking and development of the photoresist. The device has the advantages of low cost, high working efficiency, a great area of a processed pattern region, convenient assembly and adjustment, and the like. The device also facilitates the study and application of nanometer photon crystals and artificial materials.

Description

technical field [0001] The invention belongs to the technical field of nanometer processing, and relates to a device for realizing surface plasmon interference lithography. technical background [0002] With the continuous and in-depth development of nanofabrication technology, various nanophotonic devices, especially periodic nanostructures such as nanogratings and nanophotonic crystals, have gradually been widely concerned and applied in practice. For example, nano-gratings can be applied to high-precision measurement sensing and high-density storage, and nano-photonic crystals can be used as artificial materials to achieve functions such as negative refraction, super-resolution, and high-sensitivity biosensing. [0003] Since traditional photolithography is limited by the diffraction limit, in order to fabricate smaller-sized nanostructures, shorter-wavelength light sources must be used. According to this principle, the main nanofabrication technologies currently being d...

AI Technical Summary

Problems solved by technology

However, almost all substances in the extreme ultraviolet band will show completely different properties from those in the ultraviolet band, which requires the imaging system of extreme ultraviolet lithography to be re-established, which greatly increases the production cost

In addition, electron beam direct writing and focused ion beam direct writing, which work by point-by-point scanning, have high production costs, low work efficiency and small processing area, which limits their application in many fields.

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