Novel method for synthesizing SBQ sensitizer

A synthesis method and sensitizer technology, which is applied in the field of synthesis of new SBQ sensitizer, can solve the problems of increased loss, inapplicability to industrial production, and difficult drying of products.
CN101503389AInactive Publication Date: 2009-08-12ANHUI UNIVERSITY
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
ANHUI UNIVERSITY
Publication Date
2009-08-12
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention discloses a novel SBQ sensitizer synthesizing method. 4-bromomethyl pyridine synthesis and Wittig reagent synthesis are separately carried out. Under the protection of N2, NaOH aqueous solution is added in a reaction container. The Wittig reagent and terephthalaldehyde undergo magnetic stirring and 12-hour circumfluence at 25 DEG C. HCL solution is added. A claret-red solution is obtained after filtration. reduced pressure distillation is carried out to remove the HCL solution. Brick red solid, i.e. 4-[2-4-formoxphenyl] vinyl] pyridine, i.e. SBQ sensitizer is obtained after drying. SBQ sensitive glue can be prepared from the SBQ sensitizer together with accessory agents such as polyvinyl alcohol, colorant and the like according to different proportions. According to tests, 15,000 times of printing can be stood by the SBQ sensitive glue, and the printing absolution is as high as 96 percent, which is equal to an imported product.
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Description

technical field

[0001] The invention belongs to a method for synthesizing a polymer material, in particular to a method for synthesizing a novel SBQ photosensitive agent. Background technique

[0002] SBQ photosensitive glue relies on the singlet photocycloaddition reaction to crosslink PVA, so it has strong stability when it is not exposed to light, without any dark reaction, and it is being widely used in the printing industry and photoresist. SBQ photosensitive adhesive is divided into two categories: solvent-resistant type and water-resistant type. Solvent-resistant photosensitive adhesive is suitable for solvent-based inks, such as solder resist inks, embossed inks, flocking inks, instant inks, foaming inks, etc., mainly used for PCBs, circuit boards, instruments, advertising signs, various trademarks, ceramic decals Screen printing of paper, plastic, glass, enamel, metal products, etc. Water-resistant photosensitive adhesive is suitable for printing and dyeing, ceram...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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