Radio frequency SOI LDMOS device with H-shaped gate
A device and radio frequency technology, applied in the field of radio frequency SOI LDMOS devices, can solve the problems of low power density, poor resistance to total dose radiation and single particle radiation resistance, and achieve high breakdown voltage, reduce production costs, and reduce the effect of process difficulty.
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[0055] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.
[0056] Such as figure 1 as shown, figure 1 It is a schematic structural diagram of a radio frequency SOI LDMOS device with an H-shaped gate provided by the present invention. The LDMOS device consists of a silicon-on-insulator SOI with a top layer of silicon 3, a buried oxide layer 2 and a bottom layer of silicon 1 from top to bottom as the basic structure. RF LDMOS devices include:
[0057] P disposed on the upper surface of the buried oxide layer 2 - District 20, in the immediate vicinity of P - The first N - District 23 and 2nd N - District 24;
[0058] A first H-type gate oxide layer 7 and a second H-type gate oxide layer 8 disposed on the upper surface of the top silicon layer 3;
[0059] The first H-type poly...
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