Method for preparing substrate with gallium-doped zinc oxide texture and substrate prepared by the same

Abstract

The invention relates to the photovoltaic cell manufacturing field, and more specifically relates to a method for preparing a substrate with gallium-doped zinc oxide texture, a substrate prepared by the same and a silicon thin-film solar cell comprising the substrate. The method for preparing a substrate can help obtain the substrate with gallium-doped zinc oxide texture and relieve silicon thin-film solar cell manufacturers from restrictions from textured tin oxide glass suppliers, thus further reducing production and manufacturing cost. The method can be directly applied to production and manufacture of the silicon thin-film solar cell, and the substrate prepared by the method can replace the existing expensive textured tin oxide glass substrate, and shows better properties.

Description

technical field [0001] The invention relates to the field of photovoltaic cell manufacturing, in particular to a method for preparing a substrate with a gallium-doped zinc oxide textured surface, a substrate prepared by the method, and a silicon thin film solar cell comprising the substrate. Background technique [0002] In recent years, with the increasingly serious energy and environmental problems, the global photovoltaic industry has developed rapidly. As a kind of photovoltaic cell technology, silicon thin film solar cell technology is becoming more and more mature, and its photoelectric conversion efficiency and stability are also continuously improved. Compared with crystalline silicon solar cells, silicon thin film solar cells have better photovoltaic output characteristics at high temperature and have less energy repayment time. In addition, silicon thin film solar cells are particularly suitable for photovoltaic power generation modules (BIPV) combined with buildi...

AI Technical Summary

Problems solved by technology

[0004] First, the textured tin oxide film cannot withstand the continuous bombardment of hydrogen plasma, and high hydrogen dilution is necessary for the subsequent deposition of high-quality p-type layers, so the related process must be changed, that is, on the textured tin oxide film Use a weak hydrogen plasma atmosphere to grow silicon thin films in order to minimize the damage caused by hydrogen plasma. This process change has formed a technical bottleneck in improving the photoelectric conversion efficiency of silicon thin film solar cells;

[0005] Second, the current global supply of textured tin oxide glass is completely monopolized by two Japanese companies, AGC and NSG. The price of textured tin oxide glass per square meter is about 20 US dollars, accounting for about 30% of the total manufacturing cost of silicon thin film solar cells. %, so that the profit margins of silicon thin film solar cell manufacturers are greatly reduced by suppliers of textured tin oxide glass, and are restricted by others

[0006] In addition, boron-doped and aluminum-doped zinc oxide glass with textured surface cannot effectively reduce or suppress light-induced attenuation, which will have an adverse effect on further improving the photoelectric conversion efficiency of silicon thin film solar cells

Images