Epoxide resin pouring sealant with low density and high impact resistance and preparation method thereof
An epoxy resin, high impact resistance technology, applied in the direction of epoxy resin glue, chemical instruments and methods, adhesives, etc., to achieve low density, prevent further growth, and good impact resistance
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[0031] The preparation method of low density and high impact resistance epoxy resin potting glue of the present invention comprises the following steps:
[0032] a. Preparation of polyurethane prepolymer
[0033] At 80°C to 100°C, the polyurethane prepolymer is prepared by bulk polymerization of diisocyanate and diol, wherein the molar ratio of diisocyanate to diol is: -NCO:-OH=1.1~5;
[0034] b. Pretreatment of hollow glass microspheres
[0035] First dry the commercially available hollow glass microspheres at 100°C-120°C for 2 hours; then add the hollow glass microspheres into the ethanol solution of KH-550 silane coupling agent, stir and mix evenly; heat to 40°C-60°C, Ultrasonic treatment for 60 minutes, then heated to 80 ℃ ~ 120 ℃ to remove ethanol, cooled to room temperature for later use;
[0036] c. Preparation of polyurethane prepolymer-coated hollow glass microspheres
[0037] Add the polyurethane prepolymer prepared in step a into an acetone solvent to dissolve co...
Embodiment 1
[0058] Preparation of low-density high-impact epoxy potting compound.
[0059] The ratio is as follows (take the configuration of 100g potting glue as an example):
[0060] Composition Quantity Mass
[0061] E-51 epoxy resin 100 51.8g
[0062] 593 curing agent 30 15.5g
[0063] Accelerator 3 1.6g
[0064] Reactive diluent 20 10.4g
[0065] Hollow glass microspheres coated with PU prepolymer 40 20.8g
[0066] Defoamer 3 1.5g
[0067] Preparation process: Take 37.5g of PTMG-1000 vacuum dehydration, put it into a three-necked flask, heat up to 90°C-95°C to completely melt, then add 12.5g of isophorone diisocyanate, 3 drops of stannous octoate catalyst, and blow nitrogen for 10 Minutes, heated at constant temperature to continue the reaction for 3 hours, and the system temperature was lowered to room temperature to obtain a polyurethane prepolymer;
[0068] First dry 19g of hollow glass microspheres at 120°C, then add them into the ethanol solution of KH-550 silane coupling...
Embodiment 2
[0071] Change PTMG-1000 in Example 1 to PTMG-2000, other conditions are constant, can obtain low density high impact resistance epoxy resin encapsulant, its impact resistance is 15KJ / m 2 .
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