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Method for preparing chromium-titanium-aluminum-zirconium nitride multicomponent hard reaction gradient film

A nitride and multi-component technology, applied in ion implantation plating, metal material coating process, coating, etc., can solve the problems of difficult combination of single-element metal targets, decreased adhesion, low hardness index, etc., to achieve Avoid the effects of excessive internal stress, high adhesion and hardness, and uniform distribution of ingredients in the film layer

Inactive Publication Date: 2009-12-02
SHENYANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] At present, the main defects of the multi-component hard reaction film prepared by multi-arc ion plating technology lie in three aspects: first, the combination control of the single element metal target and the composition control of the film layer; second, the adhesion between the film and the workpiece , and thirdly, the hardness of the membrane
However, no matter how the arcing current is controlled, no matter what kind of workpiece placement method is used, in fact, it is difficult to ensure that the real components are evenly distributed
For the deposition of multiple (3 and above) components, it will be more difficult to control, and some elements are also difficult to process into targets
At the same time, since multiple arc sources work at the same time, it is easy to cause the workpiece to heat up too quickly, causing the stress in the film to increase and the adhesion to drop rapidly
The multi-component hard reaction film prepared by multi-arc ion plating technology on the high-speed steel substrate can generally reach 30-100N in adhesion, which is difficult to meet the needs of the tool coating layer.
Usually, the hardness of the multi-component hard reaction film obtained by using the single-element target and multi-target sharing method can be between HV2000 and 3000. Not only the hardness index is low, but also the fluctuation range is large, so it is difficult to ensure stability and repeatability.
[0005] In summary, the existing multi-arc ion plating technology for the preparation of multi-component hard reaction film has the following defects, that is, the combination of single-element metal targets is difficult to control, resulting in uneven distribution of components, unstable quality, hardness and low adhesion

Method used

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Examples

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Effect test

Embodiment 1

[0019] Preparation of chromium titanium aluminum zirconium nitride multi-component hard reaction gradient film on W18Cr4V high speed steel, the preparation method includes:

[0020] 1. Determination of deposition technology and design of alloy target composition: determine multi-arc ion plating as the preparation technology for multi-component hard reactive gradient film of chromium titanium aluminum zirconium nitride, adopt Ti-Al-Zr multi-component alloy target and The pure chromium target is used as the cathode target, the composition of the Ti-Al-Zr alloy target is 20% by mass of aluminum, 10% by mass of zirconium, the rest is titanium, and the mass percentage of titanium is 70%.

[0021] 2. Preparation of Ti-Al-Zr alloy target: using high-purity titanium sponge with a purity of 99.99%, high-purity aluminum with a purity of 99.99%, and a high-purity titanium-zirconium master alloy with a purity of 99.99% for three vacuum meltings to obtain The alloy ingot, whose composition...

Embodiment 2

[0030] Preparation of chromium titanium aluminum zirconium nitride multi-component hard reaction gradient film on W18Cr4V high speed steel, the preparation method includes:

[0031] 1. Determination of deposition technology and design of alloy target composition: determine multi-arc ion plating as the preparation technology for multi-component hard reactive gradient film of chromium titanium aluminum zirconium nitride, adopt Ti-Al-Zr multi-component alloy target and The pure chromium target is used as the cathode target, the composition of the Ti-Al-Zr alloy target is 10% by mass of aluminum, 30% by mass of zirconium, the rest is titanium, and the mass percentage of titanium is 60%.

[0032] 2. Preparation of Ti-Al-Zr alloy target: using high-purity titanium sponge with a purity of 99.99%, high-purity aluminum with a purity of 99.99%, and a high-purity titanium-zirconium master alloy with a purity of 99.99% for three vacuum meltings to obtain The alloy ingot, whose composition...

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Abstract

The invention relates to a method for preparing a chromium-titanium-aluminum-zirconium nitride multicomponent hard reaction gradient film, which comprises the following steps: 1, determination of deposition technology and designing of components of a target material; 2, preparation of a Ti-Al-Zr alloy target; 3, selection and pretreatment of workpieces, 4, determination of the quantity of arc sources; 5, determination of a pre-bombardment process; 6, determination of a deposition process; 7, vacuum heating treatment; and 8, rotation of the workpieces. The method determines the component variation range of elements such as titanium, aluminum, zirconium and the like in the Ti-Al-Zr alloy target, determines partial pressures of argon and nitrogen in the deposition process, and ensures that the prepared chromium-titanium-aluminum-zirconium nitride multicomponent hard reaction gradient film has the characteristics of strong adhesive force (more than or equal to 200 N) and high hardness (more than or equal to HV 4,000).

Description

technical field [0001] The invention relates to a method for preparing a multi-component hard reaction gradient film, in particular to a method for preparing a multi-component hard reaction gradient film by multi-arc ion plating, such as a chromium-titanium-aluminum-zirconium nitride multi-component hard reaction gradient film method of preparation. Background technique [0002] Multi-arc ion plating is a vacuum physical deposition technology with multiple cathode arc evaporation sources that can be evaporated simultaneously. It has the remarkable characteristics of fast deposition speed, dense film structure, strong adhesion, and good uniformity. This technology is suitable for the preparation of hard film and hard reaction gradient film, and has been successfully applied in the preparation of titanium nitride and titanium aluminum nitride hard reaction gradient film. Titanium aluminum nitride, titanium chromium nitride, titanium zirconium nitride and other hard composite ...

Claims

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Application Information

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IPC IPC(8): C23C14/32C23C14/06C23C14/54C23C14/02
Inventor 张钧崔贯英吕会敏葛敬鲁李丽董世柱
Owner SHENYANG UNIV
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