Static-driven tunable optical filter based on optical waveguide and F-P cavity and manufacturing method thereof

An electrostatic drive and optical filter technology, which is applied to optical waveguides, optics, instruments, etc., can solve the problems of complex manufacturing process, unfavorable optical device integration, increased coupling and packaging difficulty, etc., and achieves wide tuning range, compact and novel structure. , the effect of reducing light loss

Inactive Publication Date:
View PDF0 Cites 12 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When using a planar process to fabricate a multilayer film with an F-P cavity and a distributed Bragg reflector (DBR) structure, in order to ensure that the DBR has a high reflectivity, it is necessary to sequentially perform a complex deposition process on the substrate, and the fabrication process is complicated.
The filter with this structure needs to couple the optical fiber perpendicular to the substrate, which increases the difficulty of coupling and packaging, and is not conducive to the integration with other optical devices

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Static-driven tunable optical filter based on optical waveguide and F-P cavity and manufacturing method thereof
  • Static-driven tunable optical filter based on optical waveguide and F-P cavity and manufacturing method thereof
  • Static-driven tunable optical filter based on optical waveguide and F-P cavity and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0050] To achieve continuous tunability within the wavelength range of 1530nm to 1560nm (consistent with the spectral width of the erbium-doped fiber amplifier), the dimensions of the DBR and F-P cavities are as follows: the silicon / air gap is 2 and a half, that is, air / silicon / air / silicon / air structure, the width of the air gap is 1.9 microns, the width of the silicon is 0.5 microns; the width of the silicon waveguide F-P cavity is 5 microns. The height of the DBR is thin-layer SiO 2 and the height of both the top layer silicon and the height of the F-P cavity is thin layer SiO 2 and the height of the SOI substrate and .

[0051] The parameters of the comb electrode: the number of pairs of comb teeth is 20 pairs, the length of the comb teeth is 15 microns, the width is 5 microns, the height is 10 microns, the gap between the movable teeth and the fixed teeth is 2 microns, the overlapping length is 13 microns, The spacing is 3 microns. An elastic straight beam is used, the ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a tunable optical filter driven by a static comb-shaped electrode based on an SOI optical waveguide and an F-P cavity, as well as a manufacturing method thereof. The comb-shapedelectrode drives two symmetric DBRs to move so as to realize a tunable optical filtering function by adjusting the equivalent cavity length of the F-P cavity. The tunable optical filter with the structure has the advantages of wide tuning range, high tuning precision, high tuning speed, novel and compact structure, convenient integration with other optical and electrical elements. The symmetricaltuning method with two DBRs which move simultaneously is adopted to expand wavelength tuning range. The BDR and the F-P cavity are manufactured by taking good use of crystallographic characteristicsof a (110) silicon slice and integrating an inductive coupling plasma etching process and an anisotropy wet corrosion process, wherein the surfaces of the BDR and the F-P cavity are [111] surfaces ofsilicon crystal so as to enable the DBRs to have vertical mirror faces and smooth surfaces, thereby increasing the reflectivity of the DBRs and improving performance of the filter.

Description

technical field [0001] The invention belongs to the field of optoelectronic devices, and relates to a tunable optical filter driven by an electrostatic comb electrode based on an SOI optical waveguide and an F-P cavity and a preparation method thereof. Background technique [0002] A tunable optical filter (TOF) is a wavelength selective device, and its function is to select an optical signal of a specific wavelength from many input optical signals of different wavelengths as required. It can form a variety of demultiplexers in Dense Wavelength Division Multiplexing (DWDM) systems to separate the multiplexed lights. The key device of the new generation of all-optical network, the Optical Add-Add / Add-Demultiplexer (OADM), can also be composed of filters. Tunable optical filters should have high selectivity, low crosstalk, flat passband, low insertion loss, wide adjustable wavelength range, fast tuning speed, and potential price advantages. [0003] There are many ways to re...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G02B26/00G02B6/12G02B6/13
Inventor 董玮陈维友张歆东刘彩霞阮圣平周敬然郭文滨瞿鹏飞
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products