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Polarimetric polyurethane-urea infrared low emissivity material and preparation method thereof

A technology of polyurethane urea and low emissivity, applied in the field of optically active polyurethane urea infrared low emissivity materials and its preparation, can solve the problems of low emissivity indium tin oxide powder, etc., and achieve superior processing performance, conformational stability and thermal stability Good, highly optically active results

Active Publication Date: 2010-04-21
江苏东大科技园发展有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

CN1552660A discloses an indium tin oxide powder with low emissivity in the infrared band and its preparation method. The low-infrared emissivity materials involved in these patents use inorganic substances, and rarely involve the use of organic polymers to prepare low-infrared emissivity Material

Method used

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  • Polarimetric polyurethane-urea infrared low emissivity material and preparation method thereof
  • Polarimetric polyurethane-urea infrared low emissivity material and preparation method thereof
  • Polarimetric polyurethane-urea infrared low emissivity material and preparation method thereof

Examples

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Embodiment 1

[0022] N 2 Under atmosphere, heat 20mL N,N-dimethylformamide (DMF) to 75-80°C, add R-type 1,1'-binaphthyl-2,2'-diphenol (R -BINOL) 0.572g, continue to heat up to 100°C after dissolving it. Then, 20 mL of DMF solution of 0.2 mol / L toluene-2,4-diisocyanate (TDI) was slowly added dropwise, and reacted for 6 h to obtain the polyurethane urea prepolymer terminated by isocyanate group; N 2 Under atmosphere, naturally cool the above polyurethaneurea prepolymer to 75°C, add m-phenylenediamine (m-PhDA) 0.216g dissolved in 10mL DMF, react at 75°C for 5h, distill under reduced pressure to remove the DMF solvent, 45°C Under vacuum drying for 12 hours, the crude product of optically active polyurethane urea was obtained; the crude product of optically active polyurethane urea was washed 3 to 5 times with 150mL of absolute ethanol, and after vacuum drying at 30°C for 24 hours, an optically active polyurethane urea material with low infrared emissivity was obtained. The optical rotation of ...

Embodiment 2

[0029] N 2 Under atmosphere, heat 20mL N,N-dimethylformamide (DMF) to 75-80°C, add S-type 1,1'-binaphthyl-2,2'-diphenol (S- BINOL) 0.572g, continue to heat up to 100°C after dissolving it. Then, 20 mL of DMF solution of 0.2 mol / L toluene-2,4-diisocyanate (TDI) was slowly added dropwise, and reacted for 6 h to obtain the polyurethane urea prepolymer terminated by isocyanate group; N 2 Under the atmosphere, the above-mentioned polyurethane urea prepolymer was naturally cooled to 75 ° C, and 0.454 g of 4,4′-diaminobenzanilide dissolved in 10 mL of DMF was added, reacted at 75 ° C for 5 h, and the DMF solvent was removed by distillation under reduced pressure. Vacuum-dried at 45°C for 12 hours to obtain the crude product of optically active polyurethane urea; washed the crude product of optically active polyurethane urea with 250mL of absolute ethanol for 3 to 5 times, and vacuum-dried at 30°C for 12 hours to obtain the material of optically active polyurethane urea with low infr...

Embodiment 3

[0036] N 2 Under atmosphere, heat 20mL N,N-dimethylformamide (DMF) to 80°C, add S-type 1,1'-binaphthyl-2,2'-diol (S-BINOL) with an optical purity of 90% 0.572g, after dissolving it, continue to heat up to 100°C. Then, slowly drop 1g 4,4'-diphenylmethane diisocyanate (MDI) that is dissolved in 20mL DMF, react 6h, make the polyurethane urea prepolymer of isocyanate group termination; N 2 Under atmosphere, naturally cool the above polyurethaneurea prepolymer to 75°C, add m-phenylenediamine (m-PhDA) 0.216g dissolved in 10mL DMF, react at 75°C for 5h, distill under reduced pressure to remove the DMF solvent, 45°C Under vacuum drying for 12 hours, the crude product of optically active polyurethane urea was obtained; the crude product of optically active polyurethane urea was washed 3 to 5 times with 300 mL of absolute ethanol, and after vacuum drying at 30°C for 12 hours, an optically active polyurethane urea with low infrared emissivity material was obtained. The optical rotation ...

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Abstract

The invention aims to provide a polarimetric polyurethane-urea infrared low emissivity material and a preparation method thereof. The material has high optical rotation, high thermal stability, adjustable chain structure, stable conformation, excellent crystallization performance and high solvent resistance and can be used as both an infrared low emissivity material and a polymer substrate of an infrared stealth material. The material is prepared by hydrogen transfer addition three-monomer polymerization of R or S type 1,1'-binaphthalene-2,2'-diol, diisocyanate and diamine, wherein the optical purities of the R or S type 1,1'-binaphthalene-2,2'-diol, the diisocyanate and the diamine are is 50 to 100 percent. For the material, the glass transition temperature is above 200 DEG C, the thermo-decomposing temperature is above 250 DEG C, the absolute value of optical rotation is about 40 to 150 DEG C, and the average infrared emissivity at the 8 to 14mum band at 25 DEG C is 0.350 to 0.800.

Description

technical field [0001] The invention relates to an optically active polyurethane urea infrared low emissivity material and a preparation method thereof, which belongs to the preparation category of organic functional polymer materials and can be applied to infrared stealth materials. Background technique [0002] At present, research on new infrared stealth materials is very active, such as conductive polymers, nano-films, ultrafine particles, ferromagnetic materials, semiconductor materials, etc. Common infrared stealth materials require that the reflectivity is low enough in the widest possible band, and choosing a material with a small high-frequency dielectric constant can form a broadband low-reflectivity area on the short-wave edge of its remaining reflection band, which is conducive to broadening the absorbing frequency band . Applications are limited by the limited choice of stealthy fabrication materials. Materials used for infrared stealth should generally have l...

Claims

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Application Information

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IPC IPC(8): C08G18/32C08G18/10C07C275/40C07C273/18
Inventor 周钰明王志强孙艳青
Owner 江苏东大科技园发展有限公司
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