Polarimetric polyurethane-urea infrared low emissivity material and preparation method thereof

A technology of polyurethane urea and low emissivity, applied in the field of optically active polyurethane urea infrared low emissivity materials and its preparation, can solve the problems of low emissivity indium tin oxide powder, etc., and achieve superior processing performance, conformational stability and thermal stability Good, highly optically active results

Active Publication Date: 2010-04-21
江苏东大科技园发展有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

CN1552660A discloses an indium tin oxide powder with low emissivity in the infrared band and its preparation method. The low-infrared emissivity mate

Method used

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  • Polarimetric polyurethane-urea infrared low emissivity material and preparation method thereof
  • Polarimetric polyurethane-urea infrared low emissivity material and preparation method thereof
  • Polarimetric polyurethane-urea infrared low emissivity material and preparation method thereof

Examples

Experimental program
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Example Embodiment

[0021] Example 1

[0022] N 2 Under the atmosphere, heat 20mL N,N-dimethylformamide (DMF) to 75-80℃, and add R-type 1,1'-binaphthyl-2,2'-diphenol (R -BINOL) 0.572g, dissolve it and continue to raise the temperature to 100°C. Then, 20mL of 0.2mol / L toluene-2,4-diisocyanate (TDI) DMF solution was slowly added dropwise, and reacted for 6 hours to obtain isocyanate group-terminated polyurethane urea prepolymer; N 2 Under the atmosphere, the above polyurethane urea prepolymer was naturally cooled to 75°C, 0.216g of m-phenylenediamine (m-PhDA) dissolved in 10mL DMF was added, and reacted at 75°C for 5 hours. The DMF solvent was removed by vacuum distillation, 45°C Dry under vacuum for 12 hours to obtain crude optically active polyurethane urea; wash the crude optically active polyurethane urea with 150 mL of absolute ethanol for 3 to 5 times, and dry at 30°C for 24 hours to obtain an optically active polyurethane urea infrared low emissivity material. The optical rotation of the materi...

Example Embodiment

[0028] Example 2

[0029] N 2 In an atmosphere, 20mL of N,N-dimethylformamide (DMF) was heated to 75-80°C, and S-type 1,1'-binaphthyl-2,2'-diphenol (S- BINOL) 0.572g, after dissolving it, continue to raise the temperature to 100°C. Then, 20mL of 0.2mol / L toluene-2,4-diisocyanate (TDI) DMF solution was slowly added dropwise, and reacted for 6 hours to obtain isocyanate group-terminated polyurethane urea prepolymer; N 2 Under the atmosphere, the above polyurethane urea prepolymer was naturally cooled to 75°C, 0.454g of 4,4'-diaminobenzoic anilide dissolved in 10mL DMF was added, reacted at 75°C for 5h, and the DMF solvent was removed by vacuum distillation. After vacuum drying at 45°C for 12 hours, a crude product of optically active polyurethane urea was obtained; the crude product of optically active polyurethane urea was washed 3 to 5 times with 250 mL of absolute ethanol and dried in vacuum at 30°C for 12 hours to obtain an optically active polyurethane urea infrared low emissi...

Example Embodiment

[0035] Example 3

[0036] N 2 In an atmosphere, heat 20 mL of N,N-dimethylformamide (DMF) to 80°C, and add S-type 1,1'-binaphthyl-2,2'-diphenol (S-BINOL) with an optical purity of 90% 0.572g, dissolve it and continue to raise the temperature to 100°C. Then, 1g 4,4'-diphenylmethane diisocyanate (MDI) dissolved in 20mL DMF was slowly added dropwise, and reacted for 6h to obtain isocyanate group-terminated polyurethane urea prepolymer; N 2 Under the atmosphere, the above polyurethane urea prepolymer was naturally cooled to 75°C, 0.216g of m-phenylenediamine (m-PhDA) dissolved in 10mL DMF was added, and reacted at 75°C for 5 hours. The DMF solvent was removed by vacuum distillation, 45°C Dry under vacuum for 12 hours to obtain the crude product of optically active polyurethane urea; wash the crude product of optically active polyurethane urea with 300 mL of absolute ethanol for 3 to 5 times, and dry at 30°C for 12 hours to obtain the optically active polyurethane urea infrared low em...

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Abstract

The invention aims to provide a polarimetric polyurethane-urea infrared low emissivity material and a preparation method thereof. The material has high optical rotation, high thermal stability, adjustable chain structure, stable conformation, excellent crystallization performance and high solvent resistance and can be used as both an infrared low emissivity material and a polymer substrate of an infrared stealth material. The material is prepared by hydrogen transfer addition three-monomer polymerization of R or S type 1,1'-binaphthalene-2,2'-diol, diisocyanate and diamine, wherein the optical purities of the R or S type 1,1'-binaphthalene-2,2'-diol, the diisocyanate and the diamine are is 50 to 100 percent. For the material, the glass transition temperature is above 200 DEG C, the thermo-decomposing temperature is above 250 DEG C, the absolute value of optical rotation is about 40 to 150 DEG C, and the average infrared emissivity at the 8 to 14mum band at 25 DEG C is 0.350 to 0.800.

Description

technical field [0001] The invention relates to an optically active polyurethane urea infrared low emissivity material and a preparation method thereof, which belongs to the preparation category of organic functional polymer materials and can be applied to infrared stealth materials. Background technique [0002] At present, research on new infrared stealth materials is very active, such as conductive polymers, nano-films, ultrafine particles, ferromagnetic materials, semiconductor materials, etc. Common infrared stealth materials require that the reflectivity is low enough in the widest possible band, and choosing a material with a small high-frequency dielectric constant can form a broadband low-reflectivity area on the short-wave edge of its remaining reflection band, which is conducive to broadening the absorbing frequency band . Applications are limited by the limited choice of stealthy fabrication materials. Materials used for infrared stealth should generally have l...

Claims

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Application Information

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IPC IPC(8): C08G18/32C08G18/10C07C275/40C07C273/18
Inventor 周钰明王志强孙艳青
Owner 江苏东大科技园发展有限公司
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