High-transmissivity flexible transparent conductive film and preparation method thereof
A transparent conductive film, high transmittance technology, applied in conductive materials, conductive materials, cable/conductor manufacturing, etc., can solve the problems of low film transmittance and single film structure, and achieve low cost and photoelectric performance. Improved, improved light transmission efficiency
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[0023] Example 1
[0024] The roll-to-roll vacuum coating machine designed and manufactured by Shenyang Fushen Vacuum Equipment Co., Ltd. is used to prepare the multi-layer flexible transparent conductive film of the present invention by DC magnetron sputtering and intermediate frequency magnetron sputtering. Four samples A, B, C The specific preparation steps of and D are as follows:
[0025] a. Put the substrate material into the vacuum chamber, and evacuate the vacuum chamber to a pressure lower than 5.0×10 -3 Pa, then bombard the substrate with an ion source with a bombardment energy> 700ev;
[0026] b. Fill the vacuum chamber with oxygen and argon, and the purity of the oxygen and argon in the vacuum chamber is 99.999%. After filling with oxygen and argon, control the pressure in the vacuum chamber to 2×10 -1 Pa~5×10 -1 Within the Pa range, vacuum gauges and mass flow meters are used to monitor the vacuum degree of oxygen and argon filled into the vacuum chamber in real time;
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[0032] Example 2
[0033] Steps "a", "b", and "c" are the same as in Example 1, and step "d" is to use In with a purity of 99.99%. 2 O 3 SnO powder with purity of 99.99% 2 The powders are uniformly mixed and sintered into a target by the conventional hot isostatic pressing method. The target is used to deposit the film by the DC magnetron sputtering technique; the substrate temperature is -10~20℃, and the sputtering power is DC 500 ~1500 watts, and the sputtering rate is 0.04 ~ 3nm / s.
[0034] After the H sample is sputtered on the target, a layer of SiO is superimposed on it 2 , The thickness is 1nm.
[0035] The surface resistance of the ITO film reaches 10-15Ω / port, and the average visible light transmittance is higher than 90%. The experimental data used for the four samples E, F, G and H and the performance parameters of the prepared transparent conductive film are shown in Table 2:
[0036]
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