Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for removing moisture from chloroethylene or gas mixture with chloroethylene

A vinyl chloride and mixed gas technology, applied in separation methods, chemical instruments and methods, dispersed particle separation, etc., can solve the problems of increasing energy consumption and high regeneration temperature, and achieve improved operation flexibility, low energy consumption, and simple process flow. Effect

Active Publication Date: 2010-12-01
四川开元科技有限责任公司
View PDF3 Cites 17 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At the same time, the regeneration temperature is too high, which also increases the energy consumption.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for removing moisture from chloroethylene or gas mixture with chloroethylene
  • Method for removing moisture from chloroethylene or gas mixture with chloroethylene
  • Method for removing moisture from chloroethylene or gas mixture with chloroethylene

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0046] In this example, the flow rate of raw gas to be processed is 4000-7000Nm 3 / h, the pressure is 0.40-0.55MPa, and the temperature is 43°C. The main components and volume content of the mixed gas are shown in Table 3. The process requires the residual moisture index in the product gas to be less than 30×10 -6 , The recovery rate of vinyl chloride is greater than 99.9%.

[0047] Raw gas composition and content of table 3 embodiment 1

[0048] components

vinyl chloride

moisture

other impurities

Content (v%)

95～99.5

0.5～5

0.1～2

[0049] According to the above raw material mixed gas conditions, the drying system of this embodiment is composed of 4 dryers I, II, III and IV, and 1 heater, 1 cooler, 2 moisture separators, and 1 supercharger. Each dryer is connected with program-controlled valves for various corresponding process gases to enter or flow out. Corresponding program control valves are also designed between heaters an...

Embodiment 2

[0056] The feed gas flow rate processed in this example is 500-4000Nm 3 / h, the pressure is 0.3-0.4MPa, the temperature is 40°C, the content of the main components in the mixed gas is shown in Table 5, and the process requirement is that the residual water content in the product gas reaches ≤100×10 -6 , The recovery rate of vinyl chloride is greater than 99.9%.

[0057] Table 5 Example 2 raw material gas composition and content

[0058] components

vinyl chloride

h 2 o

Content (v%)

95～99.5

0.5～5

[0059] According to the above raw material mixed gas conditions, the drying system of this embodiment is composed of 3 dryers I, II and III, as well as 1 heater, 1 cooler and 2 moisture separators. Each dryer is connected with program-controlled valves for various corresponding process gases to enter or flow out. Corresponding program control valves are also designed between heaters and coolers. Switch between process steps such as drying,...

Embodiment 3

[0066] The flow rate of raw gas processed in this embodiment is 7000~10000Nm 3 / h, the pressure is 0.50-0.65MPa, the temperature is 47°C, the main components and contents in the mixed gas are shown in Table 7, and the process requirement is that the residual water content in the product gas reaches ≤50×10 -6 , The recovery rate of vinyl chloride is greater than 99.9%.

[0067] Table 7 Example 3 Raw Gas Components and Content

[0068] components

vinyl chloride

h 2 o

Content (v%)

98～99.5

0.5～2

[0069] According to the above raw material mixed gas conditions, the drying system of the present embodiment is composed of 4 dryers I, II, III and IV, and 1 heater, 1 cooler, 2 moisture separators, and 1 supercharger. Each dryer is connected with program-controlled valves for various corresponding process gases to enter or flow out. Corresponding program control valves are also designed between heaters and coolers. Switch between process ste...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a method for removing moisture from chloroethylene or gas mixture with chloroethylene. The method comprises the following steps: sending moisture-contained chloroethylene or gas mixture with chloroethylene from the entrance end into a dryer which is at least filled with macropore silica gel and 5A molecular sieve desiccant; performing adsorption drying under the gauge pressure of 0.30-0.70MPa; obtaining dry chloroethylene or gas mixture product with chloroethylene from the exit end of the dryer, at least heating desiccant in the dryer for desorption and cooling the desiccant to regenerate the desiccant, and performing the next adsorption drying operation repeatedly, wherein the average pore diameter of the silica-gel desiccant is 8.0-10.0nm, the specific surface area is 300-400m<2> / g, the pore volume is 0.8-1.0ml / g and the heat regeneration temperature of the desiccant is 70-150 DEG C. The total moisture content of the gas product dried by the method of the invention is up to (10-100)*10<-6>; and compared with the common drying methods and technologies such as solid caustic soda method, before and subsequent gravity dewatering method and coalescer dewatering and drying method, the method has the advantages of high dewatering accuracy, low operating cost, high recovery rate, more environmental friend and the like.

Description

technical field [0001] The invention relates to a method for removing moisture in mixed gas by adsorption, more specifically a method for removing moisture in vinyl chloride (VCM) or mixed gas containing vinyl chloride. Background technique [0002] In the production process of vinyl chloride (VCM) or polyvinyl chloride (PVC), whether the calcium carbide process or the oxychlorination process is adopted, there is a problem of dehydration and drying of vinyl chloride (VCM). If the water content is high or exceeds the production control index, it is easy to cause adverse consequences such as equipment corrosion, chloride ion pitting and VCM self-polymerization; for the calcium carbide process, it is also easy to cause self-polymerization blockage of the rectification tower, black and yellow spots in PVC and "fish". The number of "eyes" increases, which seriously affects the quality of PVC. There is a consensus on the harm of water in vinyl chloride at home and abroad, so it i...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): B01D53/04B01D53/26C07C21/06C07C17/389
Inventor 唐莉魏玺群范浩张杰彭少成
Owner 四川开元科技有限责任公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com