Method for removing moisture from chloroethylene or gas mixture with chloroethylene
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- 四川开元科技有限责任公司
- Publication Date
- 2010-12-01
Smart Images
Figure 1 Figure 2 Figure 3
Abstract
Description
technical field
[0001] The invention relates to a method for removing moisture in mixed gas by adsorption, more specifically a method for removing moisture in vinyl chloride (VCM) or mixed gas containing vinyl chloride. Background technique
[0002] In the production process of vinyl chloride (VCM) or polyvinyl chloride (PVC), whether the calcium carbide process or the oxychlorination process is adopted, there is a problem of dehydration and drying of vinyl chloride (VCM). If the water content is high or exceeds the production control index, it is easy to cause adverse consequences such as equipment corrosion, chloride ion pitting and VCM self-polymerization; for the calcium carbide process, it is also easy to cause self-polymerization blockage of the rectification tower, black and yellow spots in PVC and "fish". The number of "eyes" increases, which seriously affects the quality of PVC. There is a consensus on the harm of water in vinyl chloride at home and abroad, so it i...