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Mask aligner mask platform adopting magnetic suspension technology

A lithography machine and magnetic levitation technology, used in microlithography exposure equipment, photolithography process exposure devices, etc., can solve the problems of low air-floating bearing capacity, low supporting rigidity, low impact resistance, etc., and achieve impact resistance and anti-interference. The effect of low capacity, reduced component wear and longer service life

Inactive Publication Date: 2010-12-01
CENT SOUTH UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The conventional positioning scheme adopts the mechanical rigid contact method of rotary servo motor drive, precision ball screw drive and sliding guide rail support. This method has friction and wear, produces metal dust, and requires lubrication, and it also needs to be lubricated during startup, acceleration (deceleration), When reversing and parking, the elastic deformation, friction, coupling gap and backlash generated by the intermediate link will cause the lag and nonlinear error of the feed movement, and various connection gaps affect the positioning accuracy
The emergence of linear motors overcomes the shortcomings of the rotary motor plus screw drive mode, greatly improving its feed performance, but the metal dust generated by friction is still not conducive to the improvement of the performance and quality of integrated circuit chips
Although the air-floating support method studied in recent years has eliminated friction, because the air-floating platform uses the control of air to accelerate the flow through the air nozzle, it will generate an impact force on the guide rail, so the impact resistance is low, and the air-floating platform is limited to air flow relative to In a small space, when the external air flow is large, it will have a certain impact on its movement. In addition, the air bearing capacity is low, the support stiffness is small, and it is not suitable for working in a vacuum environment, which greatly reduces its advantages.

Method used

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  • Mask aligner mask platform adopting magnetic suspension technology
  • Mask aligner mask platform adopting magnetic suspension technology
  • Mask aligner mask platform adopting magnetic suspension technology

Examples

Experimental program
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Effect test

Embodiment 1

[0065] Example 1: The overall structure of the mask table of the lithography machine is as follows figure 1 As shown, from bottom to top, it consists of three parts: granite foundation 1, five-sided precision guide rail 2, and suspension body 3. The surface of the guide rail corresponding to the electromagnet is polished and homogenized, so that the flatness and verticality of the surface of the processed guide rail reach 1 μm. The structure of the suspended part is as figure 2 As shown in a, it includes magnesium alloy C-shaped left support plate 341, right support plate 342, aluminum alloy connector 300 (materials such as magnesium alloy and aluminum alloy have lower density and higher specific strength than rigidity compared with cast iron), 12 Block electromagnet 301A, 301B, 302A, 302B, 303A, 303B, 304A, 304B, 305A, 305B, 306A, 306B (as figure 2 b), 6 eddy current displacement sensors 311, 312, 313, 314, 315, 316, 2 linear motor movers 321, 322, 2 grating ruler readin...

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Abstract

The invention provides a mask aligner mask platform adopting the magnetic suspension technology. The mask aligner mask platform mainly comprises a precision slideway, a base, a suspension and the like, wherein the inside of the suspension is provided with an electromagnet which combines with a vortex displacement sensor to realize that the suspension is suspended above the slideway stably; the stator of a linear electric motor is fixed on the base, the rotor of the linear electric motor is fixed on the suspension; and the slideway surface is provided with a linear scale which combines with a linear scale reading-head arranged on the suspension to realize the precise and linear positioning motion of the suspension. The magnetic suspension mask aligner mask platform provided by the invention utilizes electromagnetic attraction and electromagnetic linear drive to ensure that the mask aligner mask platform can perform precise and fast reciprocating linear positioning motion, realize the functions of ultra-clean, high-speed, long-distance and precise positioning motion and the like which can not be realized by using the traditional scheme using a rotary servo motor for drive, a precision ball lead screw for transmission and a slideguide for support, and have higher suspension stiffness and better load-bearing characteristic than the gas phase suspension mask aligner mask platform.

Description

technical field [0001] The invention belongs to the technical field of ultra-precision processing and testing equipment, and relates to a photolithography machine mask table using magnetic levitation technology. The mask table is mainly used in semiconductor photolithography machines. technical background [0002] Lithography machine technology is the most widely used technology in the field of microfabrication and the core technology in the field of integrated circuit manufacturing. The mechanical structure system of the lithography machine includes a workbench, a mask table, a base, a bracket, an objective lens and a measurement system installation platform, and a vibration reduction device. The movement speed of the mask table determines the production efficiency of the lithography machine, and the mask table The positioning accuracy of the lithography machine determines the exposure accuracy of the lithography machine. The mask table with six-axis high-precision position...

Claims

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Application Information

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IPC IPC(8): G03F7/20
Inventor 段吉安周海波郭宁平
Owner CENT SOUTH UNIV
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