Method for preparing ultrafine high-purity SiO2 from volcanic ash

A technology of volcanic ash and fine height, which is applied in the field of preparation of ultra-fine high-purity SiO2, which can solve the problems of high cost, uneven particle size, and narrow primary particle size distribution, and achieve the effect of reducing preparation cost, uniform distribution, and abundant reserves

Inactive Publication Date: 2011-02-02
西藏大为建筑环保工程有限责任公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, ultrafine high-purity SiO 2 There are three main types of preparation methods: 1. The gas phase method using halosilane as raw material. The product has a narrow primary particle size distribution and good dispersion. 2 The main method, but the cost of the raw material halosilane is high, and the reaction is carried out in a high-temperature gasification environment, which has the disadvantages of complex process, strict requirements on equipment, easy loss of product, and low yield.
Two, the precipitation method using water glass as the basic raw material, although the method has a wide range of r

Method used

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  • Method for preparing ultrafine high-purity SiO2 from volcanic ash
  • Method for preparing ultrafine high-purity SiO2 from volcanic ash
  • Method for preparing ultrafine high-purity SiO2 from volcanic ash

Examples

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Example Embodiment

[0021] Example 1

[0022] A kind of preparation of ultrafine and high purity SiO from pozzolan 2 The method consists of the following steps:

[0023] A. Weigh SiO 2 100 parts by weight of pozzolans with a weight content of ≥50% are crushed to a particle size of ≤1mm.

[0024] B. Add and disperse the pozzolan into 60°C hydrochloric acid, stir for 90 minutes, filter and wash with water to obtain purified pozzolan;

[0025] C. Transfer the purified volcanic ash to 300 parts by weight of water, heat to 70℃, stir and add SiO in the volcanic ash 2 The equivalent amount of NaOH forms a uniform sol system; another 3 parts by weight of hydrophobic substances are weighed and dispersed in the sol system; then 500 parts by weight of non-aqueous solvent are introduced into the system and stirred at 1500r / min to form In the microemulsion system, the acidic substance is added dropwise to produce precipitation until no more precipitation occurs; the precipitate is filtered, washed with water, and dri...

Example Embodiment

[0027] Example 2-24

[0028] The methods for preparing ultra-fine and high-purity SiO2 in Examples 2-24 are the same as those in Example 1, except that the raw material types, ratios and specific process parameters selected in each example are replaced with those listed in the following table Corresponding raw material types, proportions and specific process parameters. The non-aqueous substances in the table refer to organic solvents that are incompatible with water.

[0029] Examples 1-24 Selected raw material types, proportions, process parameters and their products SiO 2 Particle size table

[0030]

[0031]

[0032] It can be seen from the above table that the SiO prepared by the present invention 2 The particle size is small and the distribution is uniform.

[0033] The hydrophobic substance in the present invention can be any existing oil-soluble surfactant or silane coupling agent. The water-immiscible organic solvent used in the present invention is also any existing water-...

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Abstract

The invention discloses a method for preparing ultrafine high-purity SiO2 from volcanic ash. The method comprises the following steps of: A, taking 100 weight parts of the volcanic ash of which the SiO2 content by weight is more than or equal to 50 percent, crushing the volcanic ash to ensure that the particle size is less than or equal to 1 mm; B, adding and dispersing the volcanic ash into acid solution of which the temperature is between 40 and 95 DEG C, stirring for 10 to 180 minutes, and filtering and washing; and C, transferring the volcanic ash processed in the step B into 300 weight parts of water of which the temperature is between 35 and 100 DEG C, adding NaOH or KOH of which the equivalent weight of the SiO2 is equal to that of the SiO2 in the volcanic ash with stirring to form a uniform sol system, then adding 0.5 to 5 weight parts of hydrophobic substances into the uniform sol system, introducing 500 to 1,500 weight parts of organic solvent which is immiscible with water, stirring at a high speed to form a micro-emulsion system, dropping an acidic substance to generate a deposit, filtering to obtain the deposit, and washing and drying the deposit to obtain the ultrafine high-purity SiO2. The method has the advantages of low raw material cost, simple preparation process and easy industrialization; and the prepared ultrafine high-purity SiO2 has uniform particle size distribution and high purity, and can be used as a functional filling material directly.

Description

Technical field: [0001] The invention relates to an ultrafine high-purity SiO 2 method of preparation. Background technique: [0002] Ultra-fine high-purity SiO 2 As a new type of functional material, due to its superior properties such as high dielectric, high heat resistance, high moisture resistance, high filling content, low expansion, low stress, low impurity, and low friction coefficient, it has great potential in many fields such as electronics, electrical appliances, and chemical industry. It has broad application prospects and is an ideal high-quality functional filler for electronics, electrical appliances, and chemical products. Since Stober invented the alkoxide hydrolysis process to prepare ultra-fine high-purity SiO 2 Since then, methods such as spray drying and template self-assembly have emerged one after another, and ultrafine high-purity SiO 2 The preparation method has been in continuous improvement and updating. Currently, ultrafine high-purity SiO ...

Claims

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Application Information

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IPC IPC(8): C01B33/037
Inventor 楚珑晟魏川吴浩
Owner 西藏大为建筑环保工程有限责任公司
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