Method for preparing bismuth titanate as visible light response semiconductor photochemical catalyst

A bismuth vanadate catalyst and semiconductor technology, applied in chemical instruments and methods, physical/chemical process catalysts, metal/metal oxide/metal hydroxide catalysts, etc., can solve the problem of small microwave generators and long hydrothermal treatment time , limited product output and other issues, to achieve the effects of short reaction time, easy industrial production, and simple production methods
CN101972645AInactive Publication Date: 2011-02-16南通宏洋化工有限公司 +1
5 Cites 17 Cited by

Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
南通宏洋化工有限公司
Publication Date
2011-02-16
Estimated Expiration
Not applicable · inactive patent

Smart Images

  • Figure 1
    Figure 1
  • Figure 2
    Figure 2
  • Figure 3
    Figure 3
Patent Text Reader

Abstract

The invention discloses a method for preparing bismuth titanate as a visible light response semiconductor photochemical catalyst, which comprises the steps of: dissolving bismuth salts in nitric acid at room temperature, dissolving vanadate or metavanadate same mol with the bismuth salts in 60-90 DEG C hot water, and respectively adding benzene or polyethylene glycol or a mixed solution of the benzene and the polyethylene glycol in two solutions obtained from the steps; and dropping vanadium-containing liquid into bismuth-containing liquid under the stirring state, stirring, ageing, filtering, washing and drying to prepare the bismuth titanate BiVO4 as a visible light response semiconductor photochemical catalyst. The BiVO4 prepared by the steps has the advantages of strong response of visual light, high photocatalytic oxidation degrading capability, simple preparation method, short reaction time and easy industrialized production.
Need to check novelty before this filing date? Find Prior Art

Description

technical field

[0001] The invention belongs to the technical field of inorganic materials and waste water treatment, and specifically relates to a preparation method of a visible light responsive semiconductor photocatalyst. Background technique

[0002] With the development of modern industry, especially the organic chemical industry and printing and dyeing industry, the environmental pollution of human living has become increasingly prominent. For some high-concentration and refractory organic wastewater, it is difficult to achieve ideal results by using traditional chemical and biochemical treatment methods. Since 1972, Fujishima and Honda [Fujishima A, Honda K. Electrochemical photolysis of water at a semiconductor electrode [J]. Nature, 1972, 238: 37~38] in n-type semiconductor TiO 2 Since the photocatalytic decomposition of water to produce hydrogen on single crystal electrodes, the photocatalytic process has become one of the important research directions in the fie...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More