Unlock instant, AI-driven research and patent intelligence for your innovation.

Method for preparing color separation grating by using chemical method

A technology of color separation and chemical method, applied in the field of preparation and application in high-power laser systems, can solve the problems of many operation steps, difficult to control the etching depth and step steepness, environmental pollution, etc. Effect

Inactive Publication Date: 2011-06-01
TONGJI UNIV
View PDF3 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, the preparation method of color separation grating is mainly based on the traditional method. Through the photolithography process in semiconductor technology, the required pattern is formed with photoresist, and then the pattern is etched by ion beam etching or hydrofluoric acid chemical etching. Transferred to the substrate, the preparation process requires expensive instruments such as ion beam etching machines, and at the same time, photoresist and developer will cause environmental pollution
This preparation method belongs to the processing of the substrate, it is difficult to control the etching depth and the steepness of the steps, and there are many operating steps, and each step needs two etchings to complete

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for preparing color separation grating by using chemical method
  • Method for preparing color separation grating by using chemical method
  • Method for preparing color separation grating by using chemical method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] Dissolve butyl zirconate, benzoylacetone, and deionized water in absolute ethanol respectively, add benzoylacetone and deionized water to the butyl zirconate solution successively, and add Polyvinylpyrrolidone, stirred evenly, can obtain photosensitive sol, and its sensitive wavelength is located near 350nm. Coating by pulling method, the speed is 4-6inch / min, the thickness of the film is about 700nm, after mask exposure and development, the grating pattern can be formed. The raw material ratio is: butyl zirconate: benzoylacetone: deionized water: polyvinylpyrrolidone: absolute ethanol = 1:1:2.5:0.2:20. (Benzoylacetone and acetylacetone are substances with similar properties. The difference is that the sensitive wavelengths of the formed photosensitive substances are different, and they can be added according to requirements.)

Embodiment 2

[0028] Dissolve butyl zirconate, acetylacetone, and deionized water in absolute ethanol respectively, first add the acetylacetone solution to the butyl zirconate solution drop by drop, after fully reacting, slowly drop the mixture of ethanol and water , Stir evenly, add polyvinylpyrrolidone to the sol to obtain a photosensitive sol, and its sensitive wavelength is around 304nm. Coating by pulling method, the speed is 4-6inch / min, the thickness of the film is about 700nm, after mask exposure and development, the grating pattern can be formed. The raw material ratio is: butyl zirconate: acetylacetone: deionized water: polyvinylpyrrolidone: absolute ethanol = 1:1:2.5:0.2:25.

Embodiment 3

[0030] Dissolve butyl zirconate, acetylacetone, benzoylacetone, and deionized water in absolute ethanol respectively. Among them, acetylacetone is mixed directly with benzoylacetone, and then the mixture is added dropwise to the butyl zirconate solution. After fully reacting, slowly drop the mixture of ethanol and water, stir evenly, and add polyvinylpyrrolidone to the sol to obtain a photosensitive sol with a wide sensitive wavelength range of 310-350nm. Coating by pulling method, the speed is 4-6inch / min, the thickness of the film is about 700nm, after mask exposure and development, the grating pattern can be formed. The raw material ratio is: butyl zirconate: acetylacetone: benzoylacetone: deionized water: polyvinylpyrrolidone: absolute ethanol = 1.4: 0.4: 1: 3: 0.2: 25.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention discloses a method for preparing a color separation grating by using a chemical method. The method comprises the following steps of: preparing photosensitive sol by adopting butyl zirconate as a source; adding a PVP (Polyvinylpyrrolidone) which is a superpolymer to the sol to reduce stress generated in the film preparation process so that the film thickness can be adjusted in a great range without causing the film crack; and preparing a uniform one-sided film by adopting coating with a pulling-method; and filming twice, exposing, developing to acquire a grating structure consistent with design, wherein a three-step structure with a specific height is set in each period and symmetrically distributed. Ultraviolet rays are adopted to process the color separation grating, and organic contents are removed as much as possible while a loose frame structure is kept. The method has flexible design process, good repeatability and controllability, ensures the high laser loss threshold value of the grating, avoids using high-pollution reagents, such as a photoresist, a developing solution, and the like and can be used in the manufacture field of various diffraction optical elements.

Description

technical field [0001] The invention belongs to the field of sol-gel thin film technology and diffraction optics technology, and relates to the preparation of a multi-step grating and its application in a strong laser system. Background technique [0002] Diffraction grating is a unit core device of optical instruments. Its main purpose is very clear, that is, to realize the spatial separation of polychromatic light through it. With the continuous development of micro-processing technology, the types and application range of gratings have been expanded unprecedentedly. . It is not only used in spectral analysis, but also has a wide application prospect in metrology, astronomy, quantum optics, integrated optics, optical communication, information processing and other fields. [0003] The color separation grating is a phase grating based on the principle of diffraction proposed by Daman in 1978. Its structure is composed of three steps in each cycle. When the light field pass...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/18G03F7/20G03F7/004
Inventor 周斌刘春泽周昌鹤杜艾沈军吴广明张志华
Owner TONGJI UNIV