Preparation method for suede of monocrystalline silicon solar battery

Abstract

The invention discloses a preparation method for a suede of a monocrystalline silicon solar battery, and the method comprises the following steps: (1) cleaning a silicon slice; (2) etching the cleaned silicon slice by virtue of double-frequency capacitive coupling plasma equipment, thereby obtaining a suede structure in a nano column shape; and (3) cooling and taking out the silicon slice, wherein in the step (2), the etching gas is the mixed gas of C2F6 and Ar2; the flows are respectively 5-10sccm and 0.4-0.5sccm; the background vacuum is 2-3*10<-3>Pa; the working air pressure is 20-30Pa; the high-frequency frequency and the power are 60MHz and 300w; the low-frequency frequency and the power are 2MHz and 250w; and the etching time is 10-15 minutes. According to the preparation method disclosed by the invention, the suede structure, which is in a nano column shape, of the monocrystalline silicon solar battery is obtained, and the suede structure can enable the reflection loss of lightrays to be lower than 9%, thereby achieving unexpected effects.

Description

technical field [0001] The invention relates to a method for preparing a textured surface of a solar cell, in particular to a method for preparing a textured surface of a monocrystalline silicon solar cell. Background technique [0002] Lack of energy, global warming and increasingly serious environmental pollution have promoted the rapid development of renewable energy, and solar energy has outstanding advantages such as cleanness, no pollution, and inexhaustibility, and it will become one of the ideal energy sources in the future. At present, monocrystalline silicon and polycrystalline silicon solar cells occupy a dominant position in solar cells. [0003] In the research of solar cells, optimizing the structure of the cell and improving its conversion efficiency has always been a hot research topic. Surface texturing (making suede) is an important means to improve battery conversion efficiency. Polished silicon wafers have a surface reflectance of more than 30% to sunli...

AI Technical Summary

Problems solved by technology

This method has the advantages of low cost, high reliability, high productivity and superior etching selectivity, but still has the following disadvantages: 1) It needs to use a large amount of high-cost reaction solution and deionized water; 2) Wet etching and stripping The thickness of silicon is generally on the order of microns, which is not suitable for use in thin film batteries; 3) The operator faces great safety problems during chemical treatment; 4) The formation of bubbles and the inability of the chemical etching solution to completely contact the wafer surface are caused Incomplete and uneven corrosion; 5) will produce a lot of exhaust gas and potentially explosive

[0007] However, although the current plasma etching technology can also be used to prepare the textured structure of solar cells, because the textured structure is usually at the nanometer level, it is currently only used in silicon thin film solar cells.