Gradient hydrogen process grown ZnO-TCO thin film with textured structure and use thereof

Abstract

The invention discloses a gradient hydrogen process grown ZnO-TCO thin film with a textured structure, which is prepared by using a glass substrate as a substrate, ZnO:Ga2O3 or ZnO:Al2O3 as a target material and Ar as a sputtering gas, introducing hydrogen in a sputtering process and varying the flow of the hydrogen in a gradient manner in a sputtering coating period and by a magneto-controlled sputter coating technique. The gradient hydrogen process grown ZnO-TCO thin film has the advantages that: compared with ZnO-TCO thin film with the textured structure, which is obtained by using the magneto-controlled sputter coating technique with normal hydrogen flow, the ZnO-TCO thin film with the textured structure, which is grown gradient hydrogen flow process, has higher transmissivity and better electrochemical property, and the textured structure of the thin film is improved obviously; and when the thin film is used in a microcrystalline silicon thin film cell or noncrystalline silicon cell / microcrystalline silicon tandem thin film solar cell, the light scattering effect is improved, the incident light path is increased, the thickness of an active layer is lowered effectively, and the efficiency and stability of a Si-based thin-film solar cell are improved.

Description

【Technical field】 [0001] The invention belongs to the field of thin-film solar cells, in particular to a ZnO-TCO film with a textured structure grown by a gradient hydrogen method and its application. 【Background technique】 [0002] Transparent conductive oxide (TCO) thin film material is an important part of thin film solar cells, see literature: A.V.Shah, H.Schade, M.Vanecek, et al.Progress in Photovoltaics 12(2004) 113-142, J. Müller, B. Rech, J. Springer, et al. Solar Energy 77 (2004) 917-930. The most widely used TCO film in thin film batteries is F-doped SnO 2 thin film (SnO 2 :F) and Sn-doped In 2 o 3 Film (In 2 o 3 :Sn). F-doped SnO 2 Thin films are usually prepared by atmospheric pressure CVD (APCVD) technology, and the growth temperature is high (~500°C), which will limit the further application of battery materials grown in low temperature deposition and strong H plasma environment, see literature: S. Major, S. Kumar, M. Bhatnagar, et al. Applied Physics ...

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Problems solved by technology

However, with H 2 The / Ar flow ratio increases, the resistivity of the film increases, and the electron mobility decreases. At the same time, the grain size of the film decreases and the compressive stress of the film increases.

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