A kind of method for manufacturing polyamide reverse osmosis composite membrane

A technology of reverse osmosis composite membrane and polyamide, applied in semi-permeable membrane separation, chemical instruments and methods, membrane technology, etc., can solve problems such as reducing retention rate or water flux, increasing pretreatment cost, and reducing service life. Achieve the effects of increasing the interface bonding strength, improving chemical resistance stability, and increasing the effective area

Active Publication Date: 2011-11-30
NANJING DELNAMEM TECH CO LTD
View PDF9 Cites 10 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The chemical structure of polyamide makes the chlorine resistance of this type of composite membrane very weak, and the tolerance of all commercial polyamide composite membranes to free chlorine is almost zero, which increases the pretreatment cost of the membrane and reduces the service life
In order to improve the chlorine resistance of polyamide composite membranes, a lot of work has been done at home and abroad, mainly focusing on changing the chemical structure of polyamide by using different monomers or increasing the chemical resistance of the membrane by post-treatment methods such as oxidation / chlorination of the membrane surface. stability, but such methods tend to lose other properties such as reduced rejection or water flux

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A kind of method for manufacturing polyamide reverse osmosis composite membrane

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] Example 1, before the supporting base film is immersed in the amine solution, the cyclohexanone solution containing 0.1% nanometer zeolite particles and 0.5% Anteco F-05 epoxy glue is sprayed on the surface of the polysulfone base film for 20 seconds by spraying, After standing vertically for 15 minutes, immerse in 2.0% m-phenylenediamine aqueous solution for 2 minutes, press the surface of the film with a rubber roller until it is semi-dry, then immerse in 0.2% trimesoyl chloride n-hexane solution for 20 seconds; take it out and put it in 110 ℃ oven treatment for 10 minutes, and then thoroughly washed with alkali solution, acid solution, alcohol solution and pure water to test the membrane performance. The test conditions are the same as those of the comparative example, and the results are listed in Table 1. After soaking in 1000ppm NaCl0 aqueous solution for 10 hours, the retention rate of NaCl is still as high as 92.5%. Water flux up to 1.33M 3 / M 2 .d.

Embodiment 2

[0024] Example 2, before the base film is immersed in the amine solution, spray the cyclohexanone solution containing 0.2% nanometer zeolite particles and 2.0% Antesolid F-05 epoxy glue to the surface of the polysulfone base film for 20 seconds, vertically After standing for 15 minutes, immerse in 2.0% m-phenylenediamine aqueous solution for 2 minutes; press the surface of the film with a rubber roller until it is semi-dry, then immerse in 0.2% trimesoyl chloride in n-hexane solution for 20 seconds; take it out and put it in 110°C The oven was treated for 10 minutes, and then thoroughly washed with alkali solution, acid solution, alcohol solution and pure water to test the membrane performance. The test conditions are the same as those of the comparative example, and the results are listed in Table 1. After soaking in 1000ppm NaCl0 aqueous solution for 10 hours, the retention rate of NaCl is still as high as 97.2%. Water flux up to 1.68M 3 / M 2 .d.

Embodiment 3

[0025] Example 3, before the support base film is immersed in the amine solution, spray the ethanol solution containing 0.1% nano-titanium dioxide particles and 0.5% silane coupling agent A-186 to the surface of the polysulfone base film for 20 seconds, and place it vertically for 15 minutes Finally, immerse in 2.0% m-phenylenediamine aqueous solution for 2 minutes, press the surface of the film with a rubber roller until it is semi-dry, then immerse in 0.2% trimesoyl chloride in n-hexane solution for 20 seconds; take it out and put it in an oven at 110°C for treatment After 10 minutes, the membrane performance was tested after being thoroughly washed with alkaline solution, acid solution, alcohol solution and pure water. The test conditions are the same as those of the comparative example, and the results are listed in Table 1. After soaking in 1000ppm NaCl0 aqueous solution for 10 hours, the retention rate of NaCl is still as high as 90.5%. Water flux up to 1.73M 3 / M 2 ....

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
retention rateaaaaaaaaaa
Login to view more

Abstract

The invention belongs to a method for preparing a polyamide reverse osmosis compound membrane. The method comprises the following steps of: coating a layer of epoxy compounds containing nanoparticles, silica compounds containing naoparticles, or isocyanate compounds containing nanoparticles on the surface of a support bottom membrane, immersing the coated support bottom membrane in aqueous solution of diamine or polyamine by a general polyamide reverse osmosis membrane compounding process, taking out and when the coated support bottom membrane is half-dried, immersing in solution of multi acyl chloride, performing interfacial polymerization reaction to form the polyamide reverse osmosis compound membrane, finally performing heat treatment and completely cleaning. The compound membrane hasthe chlorine resistance performance which is greater than 10,000 ppm.h, and water flux is also improved.

Description

technical field [0001] The invention relates to a method for manufacturing a polyamide reverse osmosis composite membrane, which belongs to the technical field of preparation methods of semipermeable membranes. Background technique [0002] Nanofiltration and reverse osmosis membranes have become one of the key technologies for water treatment due to their excellent separation performance for small organic molecules and inorganic salt ions, as well as safety, environmental friendliness, and easy operation. Its applications include seawater and brackish desalination, hard water softening, reclaimed water recovery, industrial wastewater treatment, ultra-pure water preparation, etc. Among them, the composite membrane has become the fastest-growing and most widely used membrane variety because of its ability to optimize the membrane’s rejection rate, water flux, and stability. Currently, more than 90% of the nanofiltration and reverse osmosis membranes on the market are composit...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B01D71/56B01D67/00B01D69/12B01D69/10
Inventor 武少禹
Owner NANJING DELNAMEM TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap