Photosensitive composition adopting composite dissolution-resistant agent/dissolution inhibitor and application of same
A solubilizer and composition technology, which is applied in the application field of positive thermal CTP plates, can solve the problems of difficult and difficult synthesis of polymer compounds, short service life of photosensitive compositions, etc., and achieve good batch stability, Improved storage stability and process stability
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Embodiment 1
[0026] Preparation method of positive thermal CTP plate
[0027] (1) Preparation of aluminum plate base:
[0028] An aluminum plate with a thickness of 0.28mm is subjected to degreasing treatment for 40 seconds in a 7wt% sodium hydroxide aqueous solution at a temperature of 55°C. Use sine wave alternating current for electrolytic treatment, 50HZ alternating current, current 50A / dm 2 , the electrolysis time is 60 seconds, control Ra=0.3-0.6um, preferably 0.4-0.6um, .Rz (H) The value is 2~3μm. Then, at a temperature of 60°C, deslagging treatment was performed for 10 seconds in a 50wt% aqueous solution of sodium hydroxide, and then at a temperature of 25°C, the current density was 5A / d m 2 , the concentration is 20wt% sulfuric acid solution for 40 seconds, control oxide film = 2.5-3.5g / m 2 . Finally, at 60 °C with NaH 2 PO 4 -NaF solution is sealed for 30 seconds to obtain an aluminum base suitable for a lithographic printing plate.
[0029] (2) Apply the prepared photose...
Embodiment 2
[0052] The photosensitive composition is shown in Table 4:
[0053] Table four
[0054] BTB29 resin (Weihai Tiancheng Chemical Co., Ltd.) 0.87g Infrared absorbing dye LC-01 (Honywell company) 0.02g Succinic anhydride ammonium acid ammonium salt 0.0075g p-toluenesulfonyl hydrazide cyclohexanone hydrazone 0.03g methyl violet 0.02g Solvent: Propylene Glycol Ether Acetate 10g
[0055] The above-mentioned photosensitive lithographic plate is installed on the plate-making machine for exposure. The alkaline developer TPD-II (manufactured by Lucky Group No. 2 Film) was used to develop at 25°C for 30 seconds. The results of sensitivity, development latitude and stability of the photosensitive composition in the solvent are shown in Table 9.
Embodiment 3
[0057] The photosensitive composition is shown in Table 5:
[0058] Table five
[0059] BTB29 resin (Weihai Tiancheng Chemical Co., Ltd.) 0.87g Infrared absorbing dye LC-01 (Honywell company) 0.02g Ammonium Phthalic Anhydride Amic Acid 0.008g
[0060] p-toluenesulfonyl hydrazide cyclohexanone hydrazone 0.0295g methyl violet 0.02g Solvent: Propylene Glycol Ether Acetate 10g
[0061] The above-mentioned photosensitive lithographic plate is installed on the plate-making machine for exposure. The alkaline developer TPD-II (manufactured by Lucky Group No. 2 Film) was used to develop at 25°C for 30 seconds. The results of sensitivity, development latitude and stability of the photosensitive composition in the solvent are shown in Table 9.
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