Silicon oxynitride chromatographic stationary phase material and preparation and application thereof
A chromatographic stationary phase and silicon oxynitride technology, which is applied to the silicon oxynitride chromatographic stationary phase material and its preparation and application fields, can solve the problems of many types of surface forces, unpredictable chromatographic behavior, complex separation mechanism, etc. The effect of structure and surface area, low industrial production cost and high reaction efficiency
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0033] The non-porous spherical silica chromatographic stationary phase material with a particle size of 1.5 microns is subjected to nitriding treatment in a high-temperature furnace with pure and dry ammonia gas. The flow rate of ammonia gas during high-temperature nitriding treatment is 0.001L / min. The nitriding temperature is 600° C., and the nitriding time is 0.1 hour. The obtained silicon oxynitride material was degassed in vacuum at 60° C. for 0.1 hour, and then washed and filtered with water and methanol in sequence. Elemental analysis showed a nitrogen content of 0.3% for the silica oxynitride chromatography stationary phase material.
Embodiment 2
[0035] The porous spherical silica chromatographic stationary phase material with a particle size of 5 microns is subjected to nitriding treatment in a high-temperature furnace with pure and dry ammonia gas, and the flow rate of ammonia gas during high-temperature nitriding treatment is 0.2L / min. The nitriding temperature is 850° C., and the nitriding time is 20 hours. The obtained silicon oxynitride material was degassed in vacuum at 200° C. for 20 hours, and then washed and filtered with water and methanol in sequence. Elemental analysis showed that the nitrogen content of the silica oxynitride chromatography stationary phase material was 8.0%.
Embodiment 3
[0037] The porous spherical silica chromatographic stationary phase material with a particle size of 1.5 microns is subjected to nitriding treatment in a high-temperature furnace with pure dry ammonia gas. The flow rate of ammonia gas during high-temperature nitriding treatment is 200L / min, and the nitriding temperature The temperature is 1200°C, and the nitriding time is 100 hours. The prepared silicon oxynitride material is degassed in vacuum at 100° C. for 0.1-20 hours, and then washed and filtered with water and methanol in sequence. Elemental analysis showed that the nitrogen content of the silica oxynitride chromatography stationary phase material was 36.6%.
PUM
Property | Measurement | Unit |
---|---|---|
particle diameter | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com