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Substrate for cell micropatterning growth as well as preparation method and application thereof

A cell pattern and substrate technology, which is applied in the field of patterned cell growth substrate and its preparation, can solve the problems of high price and the like

Inactive Publication Date: 2012-05-23
THE NAT CENT FOR NANOSCI & TECH NCNST OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The purpose of the present invention is to overcome the disadvantages that the substrates of the prior art are not commonly used in laboratories, require special equipment, and are relatively expensive

Method used

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  • Substrate for cell micropatterning growth as well as preparation method and application thereof
  • Substrate for cell micropatterning growth as well as preparation method and application thereof
  • Substrate for cell micropatterning growth as well as preparation method and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0079] Example 1 Printing polydopamine pattern on the surface of PLL-g-PEG modified glass sheet

[0080] 1. Oxidize the glass sheet.

[0081] Cut glass slides (25.4*76.2mm, sailing slides, product number 7101) into 5×5mm sizes, place them in acetone and water for ultrasonic cleaning for 10 minutes, mix concentrated sulfuric acid and hydrogen peroxide at a ratio of 3:1, and mix Soak the cleaned slides in the solution for 30 minutes and blow dry. The glass slides were oxidized in an air plasma oxidizer for 3 min.

[0082] 2. Inert modification of glass slides.

[0083] Soak the oxidized glass piece in 0.1 g / L PLL-g-PEG solution in hydroxyethylpiperazine ethylsulfuric acid (HEPES) solution (pH 7.4, 10 mM) for 2 hours, and use the PLL-g- PEG is PLL(20)-g[3.5]-PEG(5), that is, PLL is 20k, PEG is 5k, and the ratio of lysine to PEG chain in PLL is 3.5.

[0084] 3. Prepare a polydimethylsiloxane stamp.

[0085]First, use L-Edit software (The layout Editor Win 32 8.30, Tanner ED...

Embodiment 2

[0091] Example 2 Patterned Growth of Cells on PLL-g-PEG Modified Polystyrene Substrate

[0092] 1. Oxidation treatment of polystyrene flakes.

[0093] Cut a polystyrene (disposable plastic culture dish, Aisijin Medical Plastics Co., Ltd.) petri dish into 5×5 mm pieces, and put the pieces into an air plasma oxidizer to oxidize for 3 minutes.

[0094] 2. Inert modification of polystyrene flakes, wherein 10g / L of PLL-g-PEG solution of hydroxyethylpiperazineethanesulfonic acid (HEPES) solution (pH 7.4, 10mM) was used, and the PLL-g- PEG is PLL(375)-g[5]-PEG(5), that is, PLL is 375k, PEG is 5k, and the ratio of lysine to PEG chain in PLL is 5.

[0095] 3. Prepare a polydimethylsiloxane stamp.

[0096] 4. Polydopamine is formed on the surface of the stamp.

[0097] 5. Print polydopamine on the surface of polystyrene sheet.

[0098] Wherein the steps of 2-5 are consistent with the corresponding steps in embodiment 1.

[0099] 6. Inoculate cells on polystyrene surface printed w...

Embodiment 3

[0101] Example 3 Patterned generation of cells on polyethylene glycol dimethacrylate photopolymer long

[0102] 1. Preparation of Polyethylene Glycol Dimethacrylate Photopolymer

[0103] Add 1% (mass ratio) of benzoin dimethyl ether photoinitiator (purchased by sigma company, CAS number is 24650) in polyethylene glycol dimethacrylate liquid (sigma company purchases, CAS number is 25852-47-5) -42-8), oscillate to dissolve, add dropwise in a polystyrene petri dish, and irradiate with 250-400nm ultraviolet light (>60mW) for more than 2 minutes to obtain cured polyethylene glycol dimethacrylate photopolymerization thing. Add water to a Petri dish and let soak overnight. Polyethylene glycol dimethacrylate photopolymer will release itself from the polystyrene surface to form a film. Dry the film in an oven (40°C, 30 minutes).

[0104] 2. Preparation of polydimethylsiloxane stamp.

[0105] 3. Polydopamine is formed on the surface of the stamp.

[0106] 4. Printing polydopam...

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Abstract

The invention provides a substrate for cell micropatterning growth. The substrate comprises an inert surface on which cells cannot be adhered and patterns on the inert surface, wherein the patterns are formed from substances which are allowable for cell adhesion, and the inert surface is not completely covered by the patterns. The invention further provides a preparation method of the substrate, wherein a one-step printing step is adopted in the method for preparing the substrate, so that the traditional method for preparing the substrate for the cell micropatterning growth is greatly simplified, and the range for using the substrate is broadened. The invention further provides application of the substrate to the cell micropatterning growth.

Description

technical field [0001] The present invention relates to cell culture technology, in particular, the present invention relates to a substrate capable of patterned growth of cells and its preparation method and application. Background technique [0002] Cell patterning is an in vitro culture technique that limits the growth of cells to certain areas of the basal plane, and the cells will not migrate to places outside the limited area. The method of cell patterning is different from the commonly used method of directly seeding cells in culture dishes, which allows cells to spread to form a uniform cell monolayer in the culture dish. [0003] The technique of cell patterning has important applications in the study of cell-substrate interactions, cell-cell interactions, the effect of shape on cell migration, and cell responses to drug stimuli. In addition, cell patterning technology can provide a platform for constructing in vitro models and studying cell behavior at the tissue ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C12N11/14C12N11/08
Inventor 蒋兴宇孙康谢赟燕马万顺
Owner THE NAT CENT FOR NANOSCI & TECH NCNST OF CHINA
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