Method for preparing porous nano TiO2
A nano-template technology, applied in the field of photocatalytic materials, to achieve the effect of no collapse of pores, no defects on the surface, and no residual specific surface area
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Embodiment 1
[0021] Porous Nano TiO 2 Preparation of semiconductor photocatalyst:
[0022] Tetramethyl titanate: 14.0%
[0023] Tetrabutyl titanate: 15.0%
[0024] Melamine: 0.5%
[0025] Camphor: 2.5%
[0026] Ethanol: 49.0%
[0027] Acetone: 5.0%
[0028] Nitric acid: 1.0%
[0029] Acetic acid: 3.0%
[0030] Deionized water: 10.0%
[0031] Porous Nano TiO 2 Preparation of semiconductor photocatalyst: According to the above mass percentage, mix tetramethyl titanate, tetrabutyl titanate, melamine, camphor, ethanol, acetone, nitric acid and acetic acid, stir until completely dissolved, add deionized water, use frequency Ultrasonic dispersion at 28KHz and power of 1KW for 1h, reaction at 75°C for 10h under stirring, aging at room temperature for 24h to obtain TiO containing sublimation template 2 The sol was distilled under reduced pressure to remove the solvent, dried at 100°C, calcined at 180°C for 2h, 240°C for 2h, 300°C for 2h, 400°C for 3h, and 450°C for 5h, and ground to obta...
Embodiment 2
[0033] Porous Nano TiO 2 Preparation of semiconductor photocatalyst:
[0034] Tetraethyl titanate: 15.0%
[0035] Tetraisopropyl titanate: 7.0%
[0036] Benzoic acid: 1.5%
[0037] Anthracene: 1.5%
[0038] Isopropanol: 40.0%
[0039] Toluene: 18.0%
[0040] Hydrochloric acid: 3.0%
[0041] Formic acid: 2.0%
[0042] Deionized water: 12.0%
[0043] Porous Nano TiO 2 Preparation of semiconductor photocatalyst: According to the above mass percentage, mix tetraethyl titanate, tetraisopropyl titanate, benzoic acid, anthracene, isopropanol, toluene, hydrochloric acid and formic acid, stir until completely dissolved, then add deionized Water, disperse with ultrasonic waves with a frequency of 30KHz and a power of 1.5KW for 0.5h, react at 70°C for 15h under stirring, and age at room temperature for 20h to obtain TiO containing a sublimation template. 2 The sol was distilled under reduced pressure to remove the solvent, dried at 120°C, calcined at 160°C for 1 hour, 250°C for...
Embodiment 3
[0045] Porous Nano TiO 2 Preparation of semiconductor photocatalyst:
[0046] Tetra-n-propyl titanate: 10.0%
[0047] Tetra-n-butyl titanate: 20.0%
[0048] Camphor: 3.5%
[0049] 2-Hydroxybenzoic acid: 1.5%
[0050] Methanol: 5.0%
[0051] Cyclohexanone: 5.0%
[0052] Ethanol: 42.0%
[0053] Chloroacetic acid: 1.0%
[0054] Hydrochloric acid: 3.0%
[0055] Deionized water: 9.0%
[0056] porous nano Ti0 2 Preparation of semiconductor photocatalyst: According to the above mass percentage, tetra-n-propyl titanate, tetra-n-butyl titanate, camphor, 2-hydroxybenzoic acid, methanol, cyclohexanone, ethanol, chloroacetic acid and hydrochloric acid were mixed and stirred until After completely dissolving, add deionized water, disperse for 2 hours with an ultrasonic wave with a frequency of 40KHz and a power of 1.5KW, react at 70°C for 15 hours under stirring, and age at room temperature for 30 hours to obtain TiO containing a sublimation template. 2 The sol was distilled und...
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