Chemical vapor deposition device

Abstract

The invention provides a chemical vapor deposition device, which comprises a reaction chamber, a heating substrate arranged in the reaction chamber and used for heating a workpiece to be machined, and a transmission structure arranged above the heating substrate and used for transmitting the workpiece to be machined, wherein the heating substrate generates heat radiation in the process of machining the workpiece to be machined; and the transmission structure transmits or reflects the heat radiation projected to the transmission structure. By the chemical vapor deposition device, the transmission structure can be prevented from being heated by the heat radiation generated by the heating substrate to avoid raising temperature, so that a temperature condition that a reaction gas is reacted on the surface of the transmission structure to form a film is broken, the cleaning and replacement frequency of the transmission structure is greatly reduced, and the maintenance cost of equipment is reduced.

Description

technical field [0001] The invention relates to the field of solar cell manufacturing equipment, in particular to a chemical vapor deposition device for manufacturing thin-film solar cells. Background technique [0002] Among many solar cell application technologies, thin-film solar cells are widely used in aviation, aerospace and people's daily life due to a series of advantages such as no pollution, less energy consumption, low cost, and mass production. Common thin film solar cells include: amorphous silicon thin film solar cells, copper indium gallium selenide thin film cells and cadmium telluride thin film cells. In the Chinese invention patent documents with publication numbers 101027749 and 101226967, more methods for forming solar thin film cells mentioned above can be found. [0003] In the manufacture of thin-film solar cells, the deposition of transparent conductive oxide thin films is an important process link, and the transparent conductive oxide thin films are...

AI Technical Summary

Problems solved by technology

[0004] Existing chemical vapor deposition devices have the following problems: whether it is radiation heating or heat transfer heating, the heating base will emit radiant energy when heating the glass substrate, resulting in thermal radiation

During the use of the chemical vapor deposition device, with the rotation of the conveying roller, the change of thermal conditions and the increase of the thickness of the film on the surface of the conveying roller, the zinc oxide film on the surface of the conveying roller will eventually peel off, and the zinc oxide film falling below it On the heating base, it will destroy the contact tightness between the heating base and the glass substrate, or directly affect the heating effect of the heating base, which will eventually cause uneven heating of the glass substrate and damage the process quality

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