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Coating and production method thereof

A coating and hard technology, applied in the field of coating and its manufacturing, can solve the problems of inability to play an anti-oxidation effect, limitation, poor anti-oxidation effect, etc.

Inactive Publication Date: 2012-08-15
HONG FU JIN PRECISION IND (SHENZHEN) CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, since the hardness of CrN itself is not very high (about 18GPa), its application on tools or molds is limited. In addition, the oxidation resistance of the above-mentioned ZrN or CrN hard film is not good, and it is difficult to coat it on tools. Or the surface of the mold cannot play a good anti-oxidation effect, which will easily lead to the failure of the film

Method used

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  • Coating and production method thereof
  • Coating and production method thereof
  • Coating and production method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0053] Plasma cleaning: the flow of argon gas is 280sccm, the bias voltage of the hard substrate 11 is -300V, and the plasma cleaning time is 9 minutes;

[0054] Sputtering transition layer 13: 100 sccm of argon gas is introduced, a bias voltage of -50V is applied to the hard substrate 11, the chromium target 22 is turned on, the power is set to 8kw, and the deposition time is 10min.

[0055] Sputtering chromium nitride layer 151: argon gas 100sccm, nitrogen flow rate is 10sccm, chromium target 22 is turned on, the power is set to 1kw, the bias voltage applied to the hard substrate 11 is -100V, and the deposition is 20 minutes;

[0056] Sputtering the hafnium nitride layer 153: argon gas 100 sccm, nitrogen flow rate 10 sccm, the hafnium target 23 is turned on and a bias voltage of -100V is applied to the hard substrate 11 for 60 minutes of deposition.

[0057] Sputtering anti-oxidation layer 17: Use argon as the working gas with a flow rate of 150 sccm, use oxygen as a reaction gas, se...

Embodiment 2

[0059] Plasma cleaning: the flow of argon gas is 280sccm, the bias voltage of the hard substrate 11 is -300V, and the plasma cleaning time is 9 minutes;

[0060] Sputtering transition layer 13: 100 sccm of argon gas is introduced, a bias voltage of -100V is applied to the hard substrate 11, the chromium target 22 is turned on, the power is set to 10kw, and the deposition time is 20min.

[0061] Sputtering the chromium nitride layer 151: pass argon gas 100 sccm, nitrogen flow rate 40 sccm, turn on the chromium target 22, set its power to 2kw, set the bias voltage of the hard substrate 11 to -150V, and deposit for 25 minutes;

[0062] Sputtering the hafnium nitride layer 153: argon gas 100 sccm was introduced, nitrogen gas 40 sccm was set, the hafnium target 23 was turned on and a bias voltage of -200 V was applied to the hard substrate 11 for 70 minutes of deposition.

[0063] Anti-oxidation layer 17: Use argon as the working gas with a flow rate of 150 sccm, use oxygen as the reaction ...

Embodiment 3

[0065] Plasma cleaning: the flow of argon gas is 280sccm, the bias voltage of the hard substrate 11 is -300V, and the plasma cleaning time is 9 minutes;

[0066] Sputtering transition layer 13: 100 sccm of argon gas is introduced, a bias voltage of -100V is applied to the hard substrate 11, the chromium target 22 is turned on, the power is set to 13kw, and the deposition time is 30min.

[0067] Sputtering chromium nitride layer 151: argon gas 100sccm, nitrogen flow rate 70sccm, chromium target 22 is turned on, the power is set to 3kw, the bias voltage of the hard substrate 11 is set to -300V, and the deposition is 30 minutes;

[0068] Sputtering the hafnium nitride layer 153: argon gas 100 sccm, nitrogen flow rate 70 sccm, the hafnium target 23 is turned on to apply a -300V bias on the hard substrate 11, and the deposition is 90 minutes.

[0069] Anti-oxidation layer 17: Use argon as the working gas with a flow rate of 150 sccm, use oxygen as the reaction gas, set the flow rate of oxyg...

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Abstract

The invention provides a coating, which comprises a hard base, a transition layer, a composite hard layer and an antioxidant layer, wherein the transition layer, the composite hard layer and the antioxidant layer are formed sequentially on the hard base. The transition layer is a chromium layer. The composite hard layer is composed of a chromium nitride layer and a hafnium nitride layer. The antioxidant layer is an aluminum oxide layer. In addition, the invention provides a production method of the coating, which includes the steps of providing the hard base, and sequentially forming the transition layer, the composite hard layer and the antioxidant layer on the hard base by magnetron sputtering. The coating produced by the method is high in hardness and fine in oxidation resistance.

Description

Technical field [0001] The invention relates to a covering part and a manufacturing method thereof. Background technique [0002] Vacuum coating technology has a wide range of applications in the industrial field. Among them, the TiN film coating on the surface of the tool or mold can greatly increase the service life of the tool and mold. However, with the development of metal cutting processing towards high cutting speed, high feed speed, high reliability, long life, high precision and good cutting controllability, higher requirements are put forward on the performance of surface coating parts. Traditional single TiN coated parts can no longer meet the requirements in terms of hardness and toughness. [0003] ZrN film has received widespread attention because its hardness and toughness are better than TiN film. However, a single ZrN film has almost no room for improvement in hardness and oxidation resistance, and it is difficult to meet the needs of modern industries. It is al...

Claims

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Application Information

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IPC IPC(8): C23C14/16C23C14/06C23C14/35
Inventor 张新倍陈文荣蒋焕梧陈正士杜艳娜
Owner HONG FU JIN PRECISION IND (SHENZHEN) CO LTD
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