On-line treatment method of acidic etching solution

A technology of acid etching solution and treatment method, which is applied in the direction of improving process efficiency, etc., can solve the problems of increasing operating cost, shortening service life, increasing the volume of etching solution, etc., and achieves reduced operating cost, strong oxidation resistance, and reduced waste The effect of liquid volume

Inactive Publication Date: 2012-12-26
CHONGQING KOOPPER CHEM IND
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This will undoubtedly increase the volume of etching solution, which cannot meet the requirements of clean production
Even more unfortunately, the acidic etching solution contains trace amounts of oxidants, which will reduce the stability of β-diketone extractant and hydroxime extractant, shorten their service life, and increase operating costs

Method used

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  • On-line treatment method of acidic etching solution
  • On-line treatment method of acidic etching solution
  • On-line treatment method of acidic etching solution

Examples

Experimental program
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Effect test

Embodiment 1

[0058] The feature of this embodiment is that the acidic etching solution is treated with the pyridine carboxylate extractant Mextral CLX-50 and the hydroxime extractant Mextral984H. The acidic etching solution is directly extracted with pyridine carboxylate, and the copper-loaded pyridine carboxylate is back-extracted with water. The copper-containing aqueous solution after stripping is directly extracted with Mextral984H, and the copper-loaded Mextral984H is back-extracted with copper-poor electrolyte (180g / L sulfuric acid, 30g / L Cu). The copper content of the acidic etching solution is 177.81g / L, the concentration of hydrochloric acid is 1.6mol / L, and the pyridine carboxylate used is 3,5-pyridine dicarboxylate bis(isotridecyl alcohol) ester (extractant: diluent=1:3.5( w / w)), the hydroxime extractant is Mextral984H (extractant: diluent = 1:2 (w / w)), and the ratio of extraction and stripping is 1:1. Pyridine carboxylate uses one-stage extraction and one-stage stripping, and ...

Embodiment 2

[0063] The feature of this embodiment is that the acidic etching solution is treated with the pyridine carboxylate extractant Mextral CLX-50 and the β-diketone extractant Mextral 54-100. The acidic etching solution is directly extracted with pyridine carboxylate, and the copper-loaded pyridine carboxylate is back-extracted with 7.7% trisodium citrate aqueous solution. The copper-containing aqueous solution after stripping is adjusted to pH=10-12 with 40% sodium hydroxide solution, and then extracted with Mextral54-100, and copper sulfate solution (160g / L sulfuric acid, 60g / L Cu) back extraction. The copper content of the acidic etching solution is 177.81g / L, the concentration of hydrochloric acid is 1.6mol / L, and the pyridine carboxylate used is 3,5-pyridine dicarboxylate bis(isotridecyl alcohol) ester (extractant: diluent=1:3.5( w / w)), the β-diketone extractant is Mextral54-100 (extractant: diluent = 1:3 (w / w)), and the ratio of extraction and stripping is 1:1. Both extrac...

Embodiment 3

[0068] The feature of this embodiment is that the acidic etching solution is treated with pyridine carboxylate extractant Mextral CLX-50 alone. The acidic etching solution is directly extracted with pyridine carboxylate, and the copper-loaded pyridine carboxylate is back-extracted with water. The copper-containing aqueous solution after stripping is neutralized with 40% sodium hydroxide solution to pH = 9-10, and blue copper hydroxide precipitates are obtained. After the precipitate was filtered out and washed with water three times, it was burned in a muffle furnace at 800°C for 5 hours to obtain black copper oxide powder. The copper content of the acidic etching solution is 177.81g / L, the concentration of hydrochloric acid is 1.6mol / L, and the pyridine carboxylate used is 3,5-pyridine dicarboxylate bis(isotridecyl alcohol) ester (extractant: diluent=1:3.5( w / w)), the extraction ratio is O / A=4:1, and the stripping ratio is O / A=1:1. One-stage extraction and one-stage strippi...

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Abstract

The invention discloses an on-line treatment method of an acidic etching solution, which is characterized by comprising the following steps: using a pyridine carboxylic ester extracting agent Mextral CLX-50 to directly extract copper in the acidic etching solution; performing back extraction on the copper-carrying pyridine carboxylic ester extracting agent with water, a sodium citrate water solution, an ammonium citrate water solution, sodium phosphate and an ammonium phosphate water solution; performing oil removal treatment on the etching solution; and distributing for recycling. According to the invention, the acidic etching solution is directly extracted, and the oxidation resistance is high. The acidic etching solution does not need to be subjected to pretreatment (e.g. regulation of pH value and removal of oxidizer), and the service life is long. Besides, the operating cost is lowered, and simultaneously, the volume of the waste solution is reduced.

Description

technical field [0001] The invention belongs to a regeneration treatment method of acidic etching waste liquid, and in particular relates to an online treatment method of acidic etching waste liquid of a printed circuit board (PCB board). Background technique [0002] The existing on-line processing method (regeneration method) of acid etching solution is mainly electrolysis method, and the on-line processing method (regeneration method) of alkaline etching solution is mainly extraction electrolysis method. In the extractive electrolysis method, the copper ions in the etching waste liquid are first extracted into the organic phase, and the copper ions in the organic phase are back-extracted with the electrolyte, and then electrolyzed to obtain elemental copper. In the extraction process, the choice of extractant is a very critical step. The concentration of hydrogen ions in the acidic etching solution is usually greater than 1.2mol / L, and neither the β-diketone extractant n...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23F1/46C22B3/36C22B15/00
CPCY02P10/20
Inventor 汤启明徐志刚丁东升邹潜
Owner CHONGQING KOOPPER CHEM IND
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