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Preparation method of micro-nano structure

A technology of micro-nano structure and equipment, applied in the direction of ion implantation plating, metal material coating process, coating, etc., can solve the problems of inflexible control factors, difficulty in integrating nano-devices, poor crystallinity, etc., and achieve large scalability, Good controllability and good crystallinity

Inactive Publication Date: 2013-04-17
SUZHOU INST OF NANO TECH & NANO BIONICS CHINESE ACEDEMY OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the substrates used in the traditional vapor deposition method are all hard substrates. The rigid substrates used have good adhesion to the deposited organic materials and strong binding force. Device integration poses great difficulties
At the same time, the micro-nano structure prepared by the traditional vapor deposition method has the defects of poor crystallinity and inflexible control factors.

Method used

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  • Preparation method of micro-nano structure
  • Preparation method of micro-nano structure

Examples

Experimental program
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Effect test

Embodiment 1

[0029] In this embodiment, the evaporation source is copper phthalocyanine, and the ionic liquid is 1-butyl-3-methyl-imidazole nitrate, in which copper phthalocyanine and 1-butyl-3-methyl-imidazole nitrate are incompatible with each other .

[0030] The specific preparation steps of the copper phthalocyanine micro-nano structure are:

[0031] Step I: Place a quartz boat containing 0.04 g of copper phthalocyanine powder in the heating zone of the physical vapor deposition equipment. Take 2ml of 1-butyl-3-methyl-imidazole nitrate and pour it into another quartz boat and place it in the deposition area of ​​the vapor deposition device. Vacuum the chamber where the deposition area is located, and then pass the protective gas argon, and continue to vacuum for 1 hour to prevent the evaporation source from being oxidized after entering the deposition area. Control the argon pressure to 6×10 -2 pa, adjust the airflow to 100sccm, increase the temperature of the heating zone, make the copp...

Embodiment 2

[0036] The difference between this embodiment and embodiment 1 is that the selected evaporation source is fullerene (C 60 ), the mass is 50mg. Take 2ml of 1,3-dimethylimidazole hexafluorophosphate as the ionic liquid. Under the protection of nitrogen, control the working temperature not higher than C 60 The decomposition temperature is specifically 450℃, and the heating time is 2h.

[0037] After the deposition is complete, use methanol as the cleaning agent to remove excess ionic liquid to obtain figure 2 C shown 60 Micro-nano structure.

Embodiment 3

[0039] The difference between this embodiment and embodiment 1 is that the selected evaporation source is zinc octaethylporphyrin, and the mass is 25 mg. Take 2 ml of N-butyl-3-methylpicolinate methanesulfonate as the ionic liquid. Under the protection of nitrogen, the working temperature is controlled not to be higher than the decomposition temperature of zinc octaethylporphyrin, specifically 400°C, and the heating time is 1.5h.

[0040] After the deposition is completed, water is used as a cleaning agent to remove excess ionic liquid to obtain a zinc octaethylporphyrin micro-nano structure.

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Abstract

The invention relates to the technical field of material preparation, in particular to a preparation method of a micro-nano structure. The preparation method comprises the step of utilizing physical vapor deposition equipment to deposit an evaporation source to be deposited to a substrate of ionic liquid, wherein the evaporation source is not soluble in or slightly soluble in the ionic liquid. The method is simple and convenient, and has very great expansibility; the defect of separation difficulty in the traditional vapor deposition method due to the use of a hard substrate can be overcome effectively; and meanwhile the crystallinity and the purity of a product can be improved and increased effectively. The method is of great significance in preparing a device based on the organic micro-nano structure and further achieving the integration of the nano device.

Description

Technical field [0001] The invention belongs to the field of organic micro-nano structure preparation, and particularly relates to a method for preparing an organic micro-nano structure by using an ionic liquid as a flexible substrate and adopting a vapor deposition method. Background technique [0002] The preparation of organic micro-nano structures with specific morphology, size and size is of great significance for the potential applications of organic nanomaterials in optics, electricity and magnetism. Vapor deposition technology is a simple and effective method for preparing organic micro-nano structures. At present, the controllable preparation of various organic nano materials has been widely used. However, the substrates used in the traditional vapor deposition method are all rigid substrates, and the rigid substrates used have good adhesion with the deposited organic materials and strong bonding force. It is useful for preparing devices based on organic micro-nano struc...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/24C23C14/12
Inventor 潘革波王凯凯吴浩迪
Owner SUZHOU INST OF NANO TECH & NANO BIONICS CHINESE ACEDEMY OF SCI