Method for preparing bismuth vanadate/bismuth ferrite heterojunction film solar cells
A solar cell and heterojunction technology, which is applied in the manufacture of circuits, electrical components, and final products, to achieve the effects of good repeatability, wide sources, and reduced production costs
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0029] First Bi(NO 3 ) 3 ·5H 2 O and Fe(NO 3 ) 3 9H 2 O (molar ratio according to Bi:Fe=1:1) configure BiFeO with DMF as solvent 3 Precursor solution, the concentration of the precursor solution is 0.2mL / cm 2 . Secondly, Bi(NO 3 ) 3 ·5H 2 O and NH 3 VO 3 (Molar ratio according to Bi:V=1:1) proportionally and dissolved in DMF with the assistance of citric acid, acetic acid and ethanolamine, BiVO 4 precursor solution. BiVO was then prepared by the gel-spinning method 4 / BiFeO 3 heterojunction films. The conditions for throwing glue are: 1) Ultra-thin BiFeO 3 Layer preparation: Spin the glue at 500 rpm for 10 seconds and then at 3000 rpm for 30 seconds. After spinning the glue, dry the substrate with the precursor wet film on a hot plate at 350°C for 1 to 3 minutes, and finally dry it in O 2 Ultrathin BiFeO was prepared by sintering at 550 °C for 5 minutes in a rapid annealing furnace under atmosphere 3 layer; 2) BiVO 4 Layer: Spin the glue at 500rpm for 10 se...
Embodiment 2
[0032] First Bi(NO 3 ) 3 ·5H 2 O and Fe(NO 3 ) 3 9H 2 O (molar ratio according to Bi:Fe=1:1) configure BiFeO with DMF as solvent 3 Precursor solution, the concentration of the precursor solution is 0.2mL / cm 2 . Bi(NO 3 ) 3 ·5H 2 O and NH 3 VO 3 (Molar ratio according to Bi:V=1:1) proportionally and completely dissolved in DMF with the assistance of citric acid, acetic acid and ethanolamine, BiVO 4 precursor solution. BiVO was then prepared by the gel-spinning method 4 / BiFeO 3 heterojunction films. The conditions for throwing glue are: 1) Ultra-thin BiFeO 3 Layer preparation: Spin the glue at 500 rpm for 10 seconds and then at 3000 rpm for 30 seconds. After spinning the glue, dry the substrate with the precursor wet film on a hot plate at 350°C for 1 to 3 minutes, and finally dry it in O 2 The ultra-thin BFO layer was prepared by sintering in a rapid annealing furnace at 600°C for 5 minutes under atmosphere; 2) BiVO 4 Layer: Spin the glue at 500rpm for 10 se...
Embodiment 3
[0035] First Bi(NO 3 ) 3 ·5H 2 O and Fe(NO 3 ) 3 9H 2 O (molar ratio according to Bi:Fe=1:1) configure BiFeO with DMF as solvent 3 Precursor solution, the concentration of the precursor solution is 0.2mL / cm 2 . Bi(NO 3 ) 3 ·5H 2 O and NH 3 VO 3 (Molar ratio according to Bi:V=1:1) proportionally and completely dissolved in DMF with the assistance of citric acid, acetic acid and ethanolamine, BiVO 4 precursor solution. BiVO was then prepared by the gel-spinning method 4 / BiFeO 3 heterojunction films. The conditions for throwing glue are: 1) Ultra-thin BiFeO 3 Layer preparation: Spin the glue at 500 rpm for 10 seconds and then at 3000 rpm for 30 seconds. After spinning the glue, dry the substrate with the precursor wet film on a hot plate at 350°C for 1 to 3 minutes, and finally dry it in O 2 The ultra-thin BFO layer was prepared by sintering in a rapid annealing furnace at 550°C for 5 minutes under atmosphere; 2) BiVO 4 Layer: Spin the glue at 500rpm for 10 se...
PUM
| Property | Measurement | Unit |
|---|---|---|
| thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 