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Manufacturing method of large-size C-oriented sapphire crystals

A large-size, sapphire technology, which is applied in the field of growth of large-size (maximum crystal diameter: 14 inches) C-oriented sapphire single crystal, can solve problems such as sapphire single crystal cracking and sapphire crystal difficulty, and achieve core competitiveness and high weight , good crystal growth stability

Active Publication Date: 2013-05-15
TDG HLDG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0008] However, the degree of lattice deformation when growing C-oriented sapphire single crystals is significantly greater than that of other directions. Due to the anisotropy of sapphire single crystals, any heterogeneous nucleation will easily lead to cracking of sapphire single crystals.
Therefore, it is difficult to directly grow large-size, high-quality C-oriented sapphire crystals

Method used

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  • Manufacturing method of large-size C-oriented sapphire crystals
  • Manufacturing method of large-size C-oriented sapphire crystals
  • Manufacturing method of large-size C-oriented sapphire crystals

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Embodiment Construction

[0036] (1) The main ingredient ingredients are 99.999wt% high-purity alumina round cake with a diameter of 50mm and some irregular-shaped particles shown in Table 1;

[0037] (2) Filling: put the weighed alumina raw material into the crucible, and place the round cakes in a cross to prevent the liquid from splashing during melting, and fill with irregular-shaped particles;

[0038] (3) Adjust and install the heater and thermal field: adjust and install the tungsten dual heater and the tungsten-molybdenum thermal field, close the furnace cavity and install the camera, install the C-direction 30×30mm seed crystal, and adjust the position (according to theoretical calculation). , keep the seed crystal above the liquid level at a distance of 200mm from the liquid level), and start the monitor and recorder.

[0039] (4) Heating: set the heating program in the automatic control program, set the power of the main heater between 20KW and 80KW, set the power of the sub-heater between 1...

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Abstract

The invention relates to a manufacturing method of large-size C-oriented sapphire crystals. According to the method, an alumina raw material with the high purity of 99.999 wt% is adopted and is heated to be molten and subjected to crystal seeding and crystal growing. A main heater and an assistant heater are adopted, wherein a tungsten rod cylinder-shaped heating body is arranged around a crucible and is used as the main heater; another tungsten disc-shaped heating body is arranged at the bottom of the crucible and is be used as the assistant heater; the power ratio of the main heater to the assistant heater is (20 to 80 KW): (10 to 60 KW). In addition, a tungsten tube is mounted at the top of the crucible, and argon is introduced into the tungsten tube to regulate the temperature of the seed crystal and a liquid surface. As the method is used, the temperature distribution of a longitudinal temperature field in the crucible is improved, so that air bubbles, cracks and other defects are avoided or reduced, i.e., the seed crystal is prevented from being molten at overhigh temperature during the crystal seeding process. Therefore, the generation of a C-oriented long crystal boundary with a small angle is controlled effectively. As a result, the growing C-oriented crystals with the diameter of 14 inches are good in position staggering density and single crystal performance. Consequently, the method provided by the invention reaches the international advanced level.

Description

technical field [0001] The invention belongs to a method for manufacturing a sapphire single crystal, in particular to a method for growing a large-size (maximum crystal diameter of 14 inches) C-oriented sapphire single crystal. Background technique [0002] Sapphire has a high melting point (2045°C), high hardness (9 on the Mohs scale, second only to diamond), and good light transmittance (high light transmittance in the ultraviolet, visible, and infrared bands, and transmittance at 3-5 μm Pass rate as high as 85%), strong radiation resistance, high tensile strength, corrosion resistance, high thermal conductivity, good thermal shock resistance and other good properties, becoming the most widely used oxide substrate material, mainly used as a semiconductor Film substrate materials, LED chip substrate materials, large-scale integrated circuit substrates, etc. In addition, sapphire crystal is also an excellent window material for infrared military devices, missiles, submarin...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B15/00C30B29/20
Inventor 樊志远段金柱马劲松王勤峰蔡建华段斌斌徐秋峰
Owner TDG HLDG CO LTD
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