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Transparent electrically conductive film, method for manufacturing transparent electrically conductive film, photoelectric conversion device and electronic equipment

A photoelectric conversion device, transparent conductive film technology, applied in cable/conductor manufacturing, electrolytic capacitors, final product manufacturing, etc., can solve the problems of low corrosion resistance, low thermal stability, low flexibility, etc., to improve corrosion resistance, The effect of excellent corrosion resistance and high electrical conductivity

Inactive Publication Date: 2013-06-12
SONY CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the case where two-dimensional materials such as carbon nanotubes and metal nanowires are used as transparent conductive films (for example, see Patent Document 2), it is difficult to completely coat metal thin wire mesh layers while maintaining high transparency
This can cause corrosion problems due to electrolyte
Also, in the case of using a conductive polymer as a transparent conductive film (for example, see Patent Document 3), since the transparency of the conductive polymer itself is low, the transparency is significantly reduced
Although highly desirable transparent conductive films are oxide thin films including ITO and the like, oxide thin films have various problems
First, since it is necessary to produce a transparent conductive film with high quality by means of film formation by sputtering, it inevitably costs a lot
Second, since the transparent conductive film includes an oxide, it has low flexibility, and it is difficult to apply it to a flexible substrate, etc.
Third, for example, since ITO having high conductivity has very low thermal stability and low corrosion resistance, it cannot be used for transparent conductive films such as dye-sensitized solar cells
Fourth, considering its structure, it is difficult for a transparent oxide film to meet requirements such as corrosion resistance, transparent conductivity, flexibility, and simple manufacturing process.

Method used

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  • Transparent electrically conductive film, method for manufacturing transparent electrically conductive film, photoelectric conversion device and electronic equipment
  • Transparent electrically conductive film, method for manufacturing transparent electrically conductive film, photoelectric conversion device and electronic equipment
  • Transparent electrically conductive film, method for manufacturing transparent electrically conductive film, photoelectric conversion device and electronic equipment

Examples

Experimental program
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Effect test

no. 1 example

[0086] [Transparent Conductive Film]

[0087] Such as figure 1 As shown in A, in the transparent conductive film according to the first embodiment, the metal thin wire mesh layer 12 is arranged on the transparent substrate 11, and one or more graphene layers 13 are arranged on the metal thin wire mesh layer 12 . The metal fine wire mesh layer 12 is completely covered by the graphene layer 13 .

[0088] The transparent substrate 11 does not need to be flexible. The material of the transparent substrate 11 is appropriately selected according to the intended use of the transparent conductive film and the like, and examples of the material include transparent inorganic materials such as quartz and glass, and transparent plastics. A transparent plastic substrate is used as the flexible transparent substrate 11 . Examples of transparent plastics include polyethylene terephthalate, polyethylene naphthalate, polycarbonate, polystyrene, polyethylene, polypropylene, polyphenylene s...

example 1

[0112] As the first substrate 14 , an electrolytic copper foil (manufactured by Furukawa Electric Co., Ltd.) processed to have a size of 10 cm×10 cm and a thickness of 9 μm was used.

[0113] On the electrolytic copper foil, a graphene layer was formed in the same manner as in Non-Patent Document 1. That is, the electrolytic copper foil was placed in a tubular furnace of a CVD apparatus, and kept at 1000° C. for 30 minutes under a hydrogen gas flow. Thereafter, a graphene layer was grown on the electrolytic copper foil for 15 minutes under a gas flow of a mixed gas of methane and hydrogen. After the graphene layer has grown, the temperature is lowered under another flow of hydrogen. Thereafter, the electrolytic copper foil on which the graphene layer was grown was taken out from the tubular furnace.

[0114] Next, as the second substrate 15 , a PDMS / PET film was used, and the PDMS / PET film was bonded to the graphene layer on the electrolytic copper foil to be a support.

[...

example 2

[0120] A transparent conductive film was produced in the same manner as in Example 1, except that the pitch, width and thickness of the metal fine wire portion of the metal fine wire mesh layer were 600 μm, 9 μm and 10 μm, respectively.

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Abstract

The invention aims to provide a transparent electrically conductive film which has sufficiently low sheet resistance and sufficiently high transparency for visible light, can ensure high electrical conductivity over the entire surface thereof, and furthermore has excellent corrosion resistance against electrolyte, and also to provide a method for manufacturing the transparent electrically conductive film, and a photoelectric conversion device and electronic equipment using the transparent electrically conductive film. The transparent electrically conductive film comprises: a fine metal-wire network layer (12); and one or more graphene layers (13) provided on at least one face of the fine metal-wire network layer (12). The fine metal-wire network layer (12) comprises at least one type of metal selected from the group comprising copper, silver, aluminium, gold, iron, nickel, titanium and platinum. The fine metal-wire network layer (12) is provided on a transparent substrate (11). In order to obtain a flexible transparent electrically conductive film, a transparent plastic substrate is employed as the transparent substrate (11).

Description

technical field [0001] The present invention relates to a transparent conductive film, a method for producing the transparent conductive film, a photoelectric conversion device, and an electronic device, and is suitable for use in transparent conductive films used in displays, touch panels, dye-sensitized solar cells, and the like. Background technique [0002] In order to increase the area of ​​displays, make solar cells more efficient, make touch panels larger and finer, etc., transparent conductive films with low sheet resistance are required. Currently, there are three main structures for transparent conductive sheets or transparent conductive films with low resistance. [0003] The first of these structures is a transparent oxide film typified by indium tin oxide (ITO). Transparent oxide films need to be formed by means of sputtering. Therefore, there is a problem that not only the installation cost of the sputtering device is high, but also the takt time is long. ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01B5/14H01B13/00H01L31/04H01M14/00
CPCH01G9/2022H01G9/2031H01G9/2059Y02E10/542Y02E10/549B82Y30/00B82Y40/00C01B32/186Y02P70/50H10K30/83H01B5/14H01B13/00H01L31/04H01M14/00H01B1/04
Inventor 清水圭辅小林俊之
Owner SONY CORP