Mg based metallic glass film, its preparation method and application

A magnesium-based metallic glass, magnesium-based metal technology, applied in metal material coating process, vacuum evaporation coating, coating and other directions, can solve problems such as difficult adjustment, achieve easy plastic forming, low preparation cost, annealing temperature range wide effect

Active Publication Date: 2013-07-24
HUAZHONG UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the traditional bulk metallic glass preparation process, a complex cooling system is required to achieve the critical cooling rat

Method used

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  • Mg based metallic glass film, its preparation method and application
  • Mg based metallic glass film, its preparation method and application
  • Mg based metallic glass film, its preparation method and application

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0045] The general chemical formula of the magnesium-based metallic glass film of the present embodiment is Mg 58.01 Cu 28.81 Y 13.18 , the thickness of the film is 221nm, and the film substrate is a single crystal silicon wafer or an ordinary glass wafer.

[0046] The magnesium-based metallic glass film described in this embodiment is prepared by the following steps:

[0047] 1) The alloy target is prepared by using Mg, Cu and Y with a purity of 99.98% as the raw material according to the atomic ratio of 65:25:10. The preparation method of the alloy target is melting and smelting. The target is placed in the target position of the sputtering table as a target for sputtering. The ratio of Mg, Cu, and Y is not limited to 65:25:10, and other ratios may also be adopted.

[0048] 2) Put monocrystalline silicon wafers and ordinary glass wafers into ethanol for ultrasonic cleaning for a certain period of time (for example, 10 minutes), then put them in acetone for ultrasonic cle...

Embodiment 2

[0059] The average chemical composition of the magnesium-based nanocrystalline film of the present embodiment is Mg 58.01 Cu 28.81 Y 13.18 , the thickness of the film is 221nm, and the film substrate is a single crystal silicon wafer or an ordinary glass wafer.

[0060] The magnesium-based nanocrystalline film in the present embodiment is prepared by the following steps: the Mg in the embodiment 1 58.01 Cu 28.81 Y 13.18 The amorphous film was annealed in high vacuum with a vacuum degree of 1.1×10 -4 Pa, the annealing temperature is 623K, and the annealing time is 30min.

[0061] The above-mentioned magnesium-based nanocrystalline film was tested using the same method and equipment as in Example 1.

[0062] The test results are as follows:

[0063] (1) Figure 7 It is a scanning electron microscope on the surface of the sample, and the figure shows that uniformly distributed nanocrystal grains appear on the surface of the sample, and the roughness increases.

[0064] (...

Embodiment 3～6

[0069] The preparation method of the magnesium-based metallic glass films in Examples 3 to 6 is basically the same as in Example 1, except that the sputtering parameters are changed, and the sputtering parameters and the general chemical formula of the prepared films are shown in Table 1. :

[0070] Table 1: Composition and sputtering parameters of magnesium-based metallic glass films in Examples 3-6

[0071] Example

chemical composition

Sputtering power

target base distance

Sputtering argon pressure

3

Mg 46.30 Cu 28.96 Y 24.74

60W

120mm

0.3Pa

4

Mg 54.96 Cu 24.61 Y 20.43

60W

120mm

0.4Pa

5

Mg 51.73 Cu 25.87 Y 22.46

60W

120mm

0.6Pa

6

Mg 48.36 Cu 28.52 Y 23.06

60W

120mm

0.7Pa

[0072] Using the same annealing process as in Example 2, Examples 1 and 3-6 were respectively annealed to crystallize.

[0073] Embodiment 1 and 3~6 and corr...

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Abstract

The invention discloses an Mg based metallic glass film and its preparation method. The chemical general formula of the film is MgaCubYc, wherein a, b, and c are atomic percentage, a is greater than or equal to 46.30 and smaller than or equal to 58.01, b is greater than or equal to 24.61 and smaller than or equal to 28.96, c is greater than or equal to 13.18 and smaller than or equal to 24.74, and the sum of a, b and c is 100. The invention also discloses a preparation method of the Mg based metallic glass film, which is obtained by magnetron sputtering. And the method includes: preparing Mg, Cu and Y into an alloy target according to certain proportion; using a monocrystalline silicon wafer and an ordinary glass sheet as the film substrate; putting the alloy target and the film substrate into a sputtering chamber, and performing magnetron sputtering, thus obtaining the Mg based metallic glass film. The method of preparing the metallic glass film by magnetron sputtering only needs ordinary water cooling to obtain an ultrahigh cooling rate, the amorphous is easy to form, and by means of single target sputtering, the film components and thickness are adjustable, and the preparation cost is low. With large differences in amorphous and crystalline resistivity as well as reflectivity, the Mg based metallic glass film has great application prospects in phase-change optical disks and phase change memory.

Description

technical field [0001] The invention belongs to the field of metal materials, and in particular relates to a metal glass film and its preparation method and application. Background technique [0002] Metallic glasses (also known as amorphous alloys) were first obtained in 1938 by the scholar Kramer using the evaporation deposition method. In 1958, Tumbull et al. discussed the similarity of oxide glass, ceramic glass and metallic glass, determined the influence of liquid supercooling on the formation of amorphous, predicted the possibility of synthesizing metallic glass, and unveiled the amorphous alloy The prologue of the research. In 1960, Duwez et al. of California Institute of Technology in the United States first produced Au-Si metallic glass by rapid cooling of the melt (quick cooling method). Although it is unstable at room temperature, it has caused serious problems due to its unique physical properties. Widely concerned and with great interest, he became a pioneer ...

Claims

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Application Information

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IPC IPC(8): C22C45/00C23C14/35C23C14/58
Inventor 缪向水吴戈汤清华魏维
Owner HUAZHONG UNIV OF SCI & TECH
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