Preparation method of holographic grating provided with surface with periodically graded width

Abstract

A preparation method of a holographic grating provided with a surface with a periodically graded width. The preparation method comprises the following steps as follows: 1 depositing a thin-film material on the surface of a clean substrate by using a material growth technology, 2 spin-coating the thin-film material with a photoresist and conducting prebaking, 3 exposing and developing to obtain a graphical photoresist mask by using a holographic interference exposure technology so as to form a chip consisting of the substrate, the thin-film material and the graphical photoresist mask, 4 etching the surface of the chip, and 5 removing the residual photoresist to form the holographic grating provided with the surface with the periodically graded width, and accomplishing the preparation. The holographic grating with the periodically graded width prepared by the method has the advantages of large area, ordered and controllable structure, good repeatability, high stability, low manufacturing cost, simplicity in operation and the like.

Description

technical field [0001] The invention belongs to the field of semiconductor optoelectronic device technologies such as sensors, solar cells, filters, polarizers, and nanometer materials, and in particular relates to a method for preparing a holographic grating with a periodically gradient surface. Background technique [0002] The holographic grating uses the principle of optical coherent superposition, that is, through the adjustment of the complex number item (time item), the peak and valley superposition of the two beams of light waves are made to form a higher-contrast interference pattern. As an important spectrum splitting element, compared with traditional gratings, holographic gratings have the following advantages: no ghost lines in the spectrum, less stray light, high resolution, large effective aperture, high production efficiency, and low price, etc., and have been widely used in various grating spectrometers. These advantages of holographic grating make it widel...

AI Technical Summary

Problems solved by technology

Among these grating preparation methods, focused ion beam etching and electron beam etching techniques have high etching resolution and patterning freedom, and can obtain nano-grating structures with good repeatability and high stability, but these methods are costly , The process is complicated, the area of ​​the preparation substrate is small, and the speed is slow, so it cannot realize industrialized mass production

Nanoimprint technology can avoid the above problems, but it needs to make nanostructure imprint templates through fine micro-nano processing technology, and it is not convenient to randomly adjust the structural parameters of fine patterns

Images