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Positive ion-free radical mixed photopolymerisable lithographic plate printing plate material based on vinylpyrrolidone copolymer resin

A vinylpyrrolidone, lithographic printing plate technology, applied in the field of photosensitive lithographic printing plate materials, can solve problems such as reduced developability, and achieve the effects of high storage stability, little influence of humidity, and high sensitivity

Active Publication Date: 2013-10-23
浙江乾景新材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In addition, for traditional printing plates that require post-development processing, plate-making defects caused by dynamic factors of the developer can be cited, such as changes in the pH value of the developer or accumulation of photosensitive layer components in the developer, resulting in reduced developability, etc.

Method used

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  • Positive ion-free radical mixed photopolymerisable lithographic plate printing plate material based on vinylpyrrolidone copolymer resin
  • Positive ion-free radical mixed photopolymerisable lithographic plate printing plate material based on vinylpyrrolidone copolymer resin
  • Positive ion-free radical mixed photopolymerisable lithographic plate printing plate material based on vinylpyrrolidone copolymer resin

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1～7

[0113] Synthesis examples 1-7 of hybrid photosensitive compounds that can be hybridized and polymerized, and comparative examples 1-3 of compounds that cannot be hybridized and polymerized

[0114] Examples 1-7 (corresponding to compounds D1-D7), under ice-bath conditions, feed nitrogen into a three-neck flask equipped with electric stirring, constant pressure dropping funnel, and thermometer, add raw material (b) diisocyanate compound, slowly drop Add raw material (a) a vinyl ether compound with hydroxyl groups in the molecule, continue to stir for 1 hour after the dropwise addition, raise the temperature to a constant temperature of 25°C, add a catalytic amount of dibutyltin dilaurate catalyst, slowly drop under vigorous stirring Add raw material (c) a methacrylate compound with a hydroxyl group in the molecule or an acrylate compound with a hydroxyl group in the molecule, raise the temperature to 60°C after the dropwise addition, and stir at a constant temperature for two ho...

Embodiment 1～15

[0120] In a four-neck flask equipped with a stirrer, a condenser, a nitrogen conduit, and a thermometer, add N-vinylpyrrolidone monomer (NVP) and monomers containing ethylenically unsaturated double bonds at room temperature, and the solvent is absolute ethanol. Under nitrogen protection, stir and add the initiator azobisisobutyronitrile (AIBN), the initiator accounts for 0.1% to 0.5% of the total mass of NVP and monomers containing ethylenically unsaturated double bonds, preferably 0.2% to 0.3%, After the initiator is completely dissolved, the temperature of the reaction system is raised to 65-70°C and the reaction is stirred at a constant temperature, and NVP is continuously added dropwise as the reaction progresses, so that the molar ratio of NVP in the system is always maintained at the initial feeding ratio. After the reaction, the solvent was distilled off under reduced pressure to obtain a water-soluble N-vinylpyrrolidone copolymer resin. The synthesis situation of water-...

Embodiment 1

[0126] Example 1: Take 25g of the F2 resin described in Table 2, 15g of the D1 hybrid type photosensitive compound that can be hybridized in Table 1, 7g of reactive diluent isobutyl vinyl ether, 4g of 2-hydroxypropyl acrylate, and initiate Agent A1-11g, ITX1g, sensitizing pigment (B1-5) 0.5g, co-sensitizer (C1) 0.5g, acid brilliant blue 2g, acetone 300g; first dissolve F2 resin in acetone, stir to make it completely dissolved Then add other components, and then filter with 10 μm, 5 μm, and 0.5 μm pore size filter elements in sequence to obtain the photosensitive layer coating solution Example 1 containing a hybrid photosensitive compound that can be hybridized and polymerized.

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Abstract

The invention relates to a positive ion-free radical mixed photopolymerisable lithographic plate printing plate material based on vinylpyrrolidone copolymer resin which is suitable for exposure in laser with 350nm-450nm wavelength, is capable of being developed through water, and is used in a CTP (computer-to-plate) technology. The positive ion-free radical mixed photopolymerisable lithographic plate printing plate material comprises a supporter and a photosensitive layer on the supporter, the photosensitive layer comprises the following components by mass percentage: 10-80% of film-forming resin, 19-70% of hybridization mixed polymerized photosensitive compound, 0-70% of diluents, 0.1-30% of polymerization initiating system, and 0.1-15% of coloring background dye. The hybridization mixed polymerized photosensitive compound is a product of reaction of a vinyl ether compound (a) with hydroxyl in the molecule with a diisocyanate compound (b) and a methacrylate compound (c) with hydroxyl in the molecule or an acrylate compound with the hydroxyl in the molecule.

Description

technical field [0001] The present invention relates to a photosensitive lithographic printing plate material that can be developed by water and adopts cationic-free radical hybrid photopolymerization, in particular to a photopolymerizable lithographic printing plate material used in computer to plate technology (computer to plate, hereinafter referred to as CTP technology) , More specifically, the present invention relates to a scanning exposure device utilizing a light source such as a semiconductor laser that emits light in the 350-450nm wavelength region, and a cationic-radical hybrid photopolymerization type based on a vinylpyrrolidone copolymer resin that can form an image through water development. Lithographic printing plate material. In addition, the present invention also relates to a cationic-radical hybrid photopolymerizable lithographic printing plate material based on a vinylpyrrolidone copolymer resin that can be developed on-press by a fountain solution on a pr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/033G03F7/038G03F7/09B41N1/08
Inventor 周树云辛阳阳肖时卓庞玉莲邹应全陈萍严峻孙承华胡秀杰
Owner 浙江乾景新材料有限公司
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