A kind of low-temperature plasma-treated solar cell back film and preparation method thereof
A low-temperature plasma and solar cell technology, applied in chemical instruments and methods, circuits, photovoltaic power generation, etc., can solve the problems of unstable fluorosiloxane compounds and silicon-titanium compounds, difficult process uniformity, and insufficient adhesion. , to achieve the effect of convenient continuous production, large surface tension and high bonding strength
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Embodiment 1
[0033] Such as figure 1 As shown, a low-temperature plasma-treated solar cell back film is mainly composed of a base layer 1 and a fluorine-based film layer 2, wherein the surface of the base layer has a plasma-treated film layer II3; the fluorine-based film The surface of the film layer 2 has a plasma-treated film layer I4 and the surface of the plasma-treated film layer I4 has a plasma-treated surface graft copolymer layer I5, which is prepared according to the following method:
[0034] (1) Conduct water vapor microwave low-temperature plasma treatment on the surface of the THV base film layer 2 of the terpolymer of tetrafluoroethylene, hexafluoropropylene and vinylidene fluoride with a thickness of 12 μm to form a plasma-treated THV base film Layer 4, the thickness of the plasma-treated THV base film layer 4 is controlled at about 0.5 μm;
[0035] (2) Acrylic acid gas low-temperature plasma treatment is performed on the surface of the plasma-treated THV base film layer 4 of st...
Embodiment 2
[0040] The other operations of this embodiment are the same as those of embodiment 1, the differences are:
[0041] In step (1): the fluorine-based membrane layer 2 is a polytetrafluoroethylene PTFE-based membrane layer, the thickness of the fluorine-based membrane layer 2 is 20 μm, and the thickness of the plasma-treated PTFE-based membrane layer 4 is 5 μm;
[0042] In step (2), the thickness of the surface graft copolymer layer 5 is controlled at 2 μm;
[0043] In step (3), the base layer 1 is a polymer material base layer made of liquid crystal polymer or PBT resin or PEN resin by hot melt blending modified PET resin, wherein the content of liquid crystal polymer or PBT resin or PEN resin is 30 wt. %, and the thickness of the base layer 1 is 300 μm, and the thickness of the plasma-treated PET base film layer 3 is 2 μm.
[0044] The test results are shown in Table 1.
Embodiment 3
[0046] The other operations of this embodiment are the same as those of embodiment 1, the differences are:
[0047] In step (1): the fluorine-based film layer 2 is a polyvinyl fluoride PVF-based film layer, the thickness of the fluorine-based film layer 2 is 1 μm, and the thickness of the plasma-treated PVF base film layer 4 is 0.05 μm;
[0048] In step (2), the thickness of the surface graft copolymer layer 5 is controlled at 0.2 μm;
[0049] In step (3), the base layer 1 is a polymer material base layer made of liquid crystal polymer or PBT resin or PEN resin by hot melt blending modified PET resin, wherein the content of liquid crystal polymer or PBT resin or PEN resin is 10 wt. %, and the thickness of the base layer 1 is 10 μm, and the thickness of the plasma-treated PET base film layer 3 is 0.4 μm.
[0050] In step (4), the bonding temperature is 50°C, and the baking time is 5s.
[0051] The test results are shown in Table 1.
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