Texturing method for solar cell

A technology for the surface of solar cells and silicon wafers, applied in the field of solar cells, can solve the problems of high suede reflectivity, many surface defects, difficult mass production, etc., and achieve the effects of simple process, few surface defects and low production cost

Active Publication Date: 2013-10-30
HUIZHOU BYD BATTERY
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  • Abstract
  • Description
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Problems solved by technology

[0005] The invention solves the technical problems of high reflectivity of the suede surface, many surface def

Method used

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  • Texturing method for solar cell
  • Texturing method for solar cell
  • Texturing method for solar cell

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0032] (1) Add 50g of sodium silicate and 30g of carboxymethyl cellulose into 2kg of water, stir slowly until the two are completely dispersed; then add 1kg of silicon powder with a particle size of 2μm, and continue stirring for 5h until the silicon powder is evenly dispersed to obtain silicon slurry.

[0033] (2) Use the screen printing method to use the above-mentioned mixed paste containing silicon powder, and the commercial specification is 156*156mm 2 The silicon paste prepared in step (1) was printed on the surface of the polycrystalline silicon wafer to form a silicon powder lattice with a dot diameter of 4 μm, a dot pitch of 2 μm, and a height of 10 μm, and dried in a chain oven at 80°C.

[0034] (3) Put the silicon wafer with a silicon powder lattice on the surface obtained in step (2) into an acidic etching solution at a temperature of 8°C for 4 minutes and chemically etch it. The acidic etching solution contains a volume ratio of HF:HNO 3 :H 2 The mixed system of...

Embodiment 2

[0036] (1) Add 20g of orthosilicic acid and 5g of ethyl cellulose into 1kg of water, stir slowly until the two are completely dispersed; then add 1kg of silicon powder with a particle size of 15μm, and continue stirring for 5h until the silicon powder is evenly dispersed to obtain a silicon slurry material.

[0037] (2) Use the screen printing method to use the above-mentioned mixed paste containing silicon powder, and the commercial specification is 156*156mm 2 The silicon paste prepared in step (1) was printed on the surface of the polycrystalline silicon wafer to form a silicon powder lattice with a dot diameter of 20 μm, a dot pitch of 5 μm, and a height of 30 μm, and dried in a chain oven at 80°C.

[0038] (3) Put the silicon wafer with a silicon powder lattice on the surface obtained in step (2) into an alkaline etching solution at a temperature of 50°C for 1 minute and chemically etch it for 1 minute. The alkaline etching solution is 8wt% KOH solution to obtain textured...

Embodiment 3

[0040] (1) Add 200g of silica gel and 100g of ethyl cellulose into 5kg of water, and stir slowly until the two are completely dispersed; then add 1kg of silicon powder with a particle size of 1 μm, and continue stirring for 5 hours until the silicon powder is evenly dispersed to obtain a silicon slurry.

[0041] (2) Use the screen printing method to use the above-mentioned mixed paste containing silicon powder, and the commercial specification is 156*156mm 2 The silicon paste prepared in step (1) was printed on the surface of the polycrystalline silicon wafer to form a silicon powder lattice with a dot diameter of 1 μm, a dot pitch of 1 μm, and a height of 3 μm, and dried in a chain oven at 80°C.

[0042](3) Put the silicon wafer with a silicon powder lattice on the surface obtained in step (2) into an acidic etching solution at a temperature of 8°C for 4 minutes and chemically etch it. The acidic etching solution contains a volume ratio of HF:HNO 3 :H 2 The mixed system of O...

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Abstract

The present invention provides a texturing method for a solar cell. The texturing method comprises a step A. coating a surface of a silicon wafer with a silicon slurry which is a mixture of ganister sand, a binder and water to form a ganister sand dot matrix with a height of 3-30[Mu]m; and a step B. carrying out chemical etching on the surface, where the ganister sand dot matrix is formed, of the silicon wafer, and forming a concave-convex antireflection structure on the surface of the silicon wafer after etching to obtain a textured silicon wafer. According to the texturing method for the solar cell, texturing reflectance of the silicon wafer is below 5% with regular and uniform texturing and few surface defects, and therefore the performance of the solar cell can be effectively improved. In addition, the process is simple and mass production can be achieved.

Description

technical field [0001] The invention belongs to the field of solar cells, in particular to a method for making texture of solar cells. Background technique [0002] Solar cells directly convert light energy into electrical energy. Compared with other energy sources, it reduces a lot of intermediate links that cause energy loss. Therefore, for the entire earth's energy system, it has the highest utilization compared to other forms of solar energy utilization methods. Rate. At the same time, solar cells emit zero emissions during use and have no pollution to the environment. They are the most representative energy source in a modern low-carbon society. [0003] In the manufacturing process of crystalline silicon solar cells, in order to collect more light, the common practice in the field of solar cells is to immerse the cells in an acidic etching solution mainly composed of hydrofluoric acid and nitric acid or an acid corrosion solution mainly composed of NaOH or KOH. In th...

Claims

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Application Information

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IPC IPC(8): H01L31/18C30B33/10
CPCY02P70/50
Inventor 姜俊刚王胜亚张丹刘海英孙玉星廖涛明王楠姜新军李美娟鹿兆岩
Owner HUIZHOU BYD BATTERY
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