Organic light-emitting device and preparation method thereof
An electroluminescent device and electroluminescent technology, which is applied in the fields of electro-solid devices, semiconductor/solid-state device manufacturing, electrical components, etc., can solve the problems of difficult evaporation temperature, entry into traps, exciton loss, etc., to enhance the light extraction efficiency Effect
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[0034] The preparation method of the above-mentioned organic electroluminescent device comprises the following steps:
[0035] S1. First, carry out photolithography treatment on the anode base, cut it into the required size, and then use detergent, deionized water, acetone, ethanol, and isopropanol to ultrasonically clean it for 15 minutes to remove organic pollutants on the surface of the anode base;
[0036] S2. Perform oxygen plasma treatment on the conductive anode layer of the cleaned anode base to improve the work function of the conductive anode layer of the anode base. The treatment time is 5-15min, and the treatment power is 10-50W;
[0037] S3, sequentially stacking an evaporated hole injection layer, a hole transport layer, a light-emitting layer and a first electron transport layer on the surface of the conductive anode layer of the anode substrate treated with oxygen plasma;
[0038] S4. Next, thermally evaporate an electron blocking layer on the surface of the fi...
Embodiment 1
[0046] First, the ITO glass is subjected to photolithography treatment, cut into the required size, and the organic pollutants on the surface of the ITO glass are removed with detergent, deionized water, acetone, ethanol, and isopropanol for 15 minutes each;
[0047] After cleaning, the ITO layer of the ITO glass is treated with oxygen plasma, the treatment time is 10min, and the power is 30W;
[0048] On the surface of the ITO layer after oxygen plasma treatment, the vapor-deposited hole injection layer is sequentially stacked, and the material is MoO 3 , the thickness is 40nm, the hole transport layer, the material is NPB, the thickness is 40nm, the light emitting layer, the material is Alq3, the thickness is 15nm, the first electron transport layer, the material is Bphen, the thickness is 60nm;
[0049] Then thermally evaporated an electron blocking layer with a thickness of 100 nm on the surface of the first electron transport layer, the material is a doped mixed material ...
Embodiment 2
[0053] First, the IZO glass is photolithographically processed, cut into the required size, and then ultrasonicated for 15 minutes with detergent, deionized water, acetone, ethanol, and isopropanol to remove organic pollutants on the surface of the IZO glass;
[0054] After cleaning, the IZO layer of the IZO glass is treated with oxygen plasma, the treatment time is 5min, and the power is 50W;
[0055] On the surface of the IZO layer after oxygen plasma treatment, the evaporated hole injection layer is sequentially stacked, and the material is WO 3 , the thickness is 50nm, the hole transport layer, the material is TCTA, the thickness is 60nm, the light emitting layer, the material is DCJTB, the thickness is 5nm, the first electron transport layer, the material is TPBi, the thickness is 80nm;
[0056] Then thermally evaporated on the surface of the first electron transport layer and have a thickness of 150nm electron blocking layer, the material is a doped mixed material formed...
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