High-strength multilayer-film photoelectric glass and preparation method thereof
A technology of photoelectric glass and multi-layer film, applied in photovoltaic power generation, coating, circuit and other directions, can solve problems affecting product performance and other issues
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[0024] The present invention will be further described below in conjunction with the accompanying drawings and embodiments, but not as a basis for limiting the present invention.
[0025] Example. A high-strength multi-layer photoelectric glass comprises a glass substrate 1 on which a silicon dioxide layer 2 , an aluminum oxide thin film layer 3 and an AZO thin film layer 4 are sequentially arranged. The silicon dioxide layer 2 is a high-purity silicon dioxide layer.
[0026] To realize the preparation method of the aforementioned high-strength multilayer film-based photoelectric glass, proceed as follows:
[0027] ① Pre-clean the glass substrate;
[0028] ② Repeat step ① 3-4 times, and then dry in a vacuum oven;
[0029] ③Cleaning the glass substrate by ion beam sputtering under vacuum conditions;
[0030] ④ In the environment where argon is used as the working gas, silicon dioxide, aluminum oxide and AZO (collectively referred to as sputtering targets) are ...
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