Organic light-emitting device and production method thereof
An electroluminescent device and luminescent technology, which is applied in the direction of electric solid-state devices, semiconductor/solid-state device manufacturing, electrical components, etc., can solve the problem of low luminous efficiency
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
preparation example Construction
[0040] Please also see figure 2 , the preparation method of the organic electroluminescent device 100 of an embodiment, it comprises the following steps:
[0041] Step S110 , sequentially vapor-depositing the hole injection layer 20 , the first hole transport layer 32 , the first light emitting layer 34 and the first electron transport layer 36 on the surface of the anode.
[0042] The anode 10 is indium tin oxide glass (ITO), aluminum zinc oxide glass (AZO) or indium zinc oxide glass (IZO), preferably ITO.
[0043] In this embodiment, before the hole injection layer 20 is formed on the surface of the anode 10, the anode 10 is pretreated. The pretreatment includes: performing photolithography on the anode 10, cutting it into the required size, using detergent, deionized Water, acetone, ethanol, and isopropanone were each ultrasonically cleaned for 15 minutes to remove organic pollutants on the surface of the anode 10 .
[0044] The hole injection layer 20 is formed on the s...
Embodiment 1
[0067] The structure prepared in this example is: ITO glass / MoO 3 / NPB / BCzVBi / TAZ / ZnS:MoO 3 / Au / CdS:Ta 2 o 5 / NPB / BCzVBi / TAZ / LiF / Ag organic electroluminescent devices.
[0068] First carry out photolithography treatment on ITO, cut it into the required size, and then use detergent, deionized water, acetone, ethanol, and isopropanol to sonicate for 15 minutes each to remove organic pollutants on the glass surface; evaporate the hole injection layer , the material is MoO 3 , with a thickness of 40nm; evaporated the first hole transport layer, made of NPB, with a thickness of 25nm; evaporated the first light-emitting layer, made of BCzVBi, with a thickness of 30nm; evaporated the first electron transport layer, made of TAZ, with a thickness of 60nm; preparation of the charge generation layer: composed of a first metal sulfide doped layer, a metal layer and a second metal sulfide doped layer. The materials for vapor deposition of the first metal sulfide doped layer include Zn...
Embodiment 2
[0073] The structure prepared in this example is AZO / V 2 o 5 / TAPC / ADN / TPBi / CaS:WO 3 / Pt / ZnS:Nb 2 o 5 / TCTA / ADN / Bphen / CsN 3 / Pt organic electroluminescent devices.
[0074] First, the AZO glass substrate was washed with detergent, deionized water, and ultrasonic for 15 minutes to remove organic pollutants on the glass surface; the hole injection layer was prepared by evaporation, and the material was V 2 o 5 , the thickness is 80nm; the first hole transport layer is prepared by evaporation, the material is TAPC, and the thickness is 60nm; the first light-emitting layer is prepared by evaporation, the material is ADN, and the thickness is 5nm; the first electron transport layer is prepared by evaporation, and the material is TPBi, with a thickness of 200nm; the charge generation layer prepared by vapor deposition: consisting of a first metal sulfide doped layer, a metal layer and a second metal sulfide doped layer. The materials for evaporation of the first metal sulfide...
PUM
| Property | Measurement | Unit |
|---|---|---|
| Thickness | aaaaa | aaaaa |
| Thickness | aaaaa | aaaaa |
| Thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 


